Toward accurate linewidth metrology using atomic force microscopy and tip characterization

Ronald Dixson, Jason Schneir, Thomas H. McWaid, Neal T. Sullivan, Vincent W. Tsai, Saleem H. Zaidi, Steven R. Brueck

Research output: Chapter in Book/Report/Conference proceedingConference contribution

10 Citations (Scopus)

Abstract

Atomic force microscopes (AFMs) are potentially capable of dimensional metrology with nanometer scale accuracy. Feature width measurements, however, can be severely affected by the size of an AFM probe. Indeed, for features with sufficiently steep sidewalls, a conical AFM probe may only be able to measure the width near the top of a line, with much of the apparent width at the bottom being due to the size of the probe. Although the probe contribution to the apparent feature width is generally much smaller at the top, it is often not negligible. Thus, the accuracy and value of such 'top width' measurements could potentially be improved by using another sample to independently characterize the geometry of the tip and correcting the measured top width for the finite size of the probe. We performed a test of this measurement scheme by using the NIST calibrated atomic force microscope (C-AFM), an AFM with metrology traceable to the wavelength of light, to perform top width measurements on a sample of preferentially etched Si lines. Samples of mica with nanometer sized colloidal particles deposited on them were used to characterize the C-AFM tips, and thus correct apparent top width measurements for the probe size. Except when probe damage during a measurement was severe, comparisons of the C-AFM results with cross sectional TEM yielded good agreement with uncertainties at the level of 30 nm (2 sigma).

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsSusan K. Jones
Pages589-607
Number of pages19
Volume2725
Publication statusPublished - 1996
Externally publishedYes
EventMetrology, Inspection, and Process Control for Microlithography X - Santa Clara, CA, USA
Duration: 11 Mar 199613 Mar 1996

Other

OtherMetrology, Inspection, and Process Control for Microlithography X
CitySanta Clara, CA, USA
Period11/3/9613/3/96

Fingerprint

Linewidth
Atomic force microscopy
Microscopes
Mica
Transmission electron microscopy
Wavelength
Geometry

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Dixson, R., Schneir, J., McWaid, T. H., Sullivan, N. T., Tsai, V. W., Zaidi, S. H., & Brueck, S. R. (1996). Toward accurate linewidth metrology using atomic force microscopy and tip characterization. In S. K. Jones (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 2725, pp. 589-607)

Toward accurate linewidth metrology using atomic force microscopy and tip characterization. / Dixson, Ronald; Schneir, Jason; McWaid, Thomas H.; Sullivan, Neal T.; Tsai, Vincent W.; Zaidi, Saleem H.; Brueck, Steven R.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Susan K. Jones. Vol. 2725 1996. p. 589-607.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Dixson, R, Schneir, J, McWaid, TH, Sullivan, NT, Tsai, VW, Zaidi, SH & Brueck, SR 1996, Toward accurate linewidth metrology using atomic force microscopy and tip characterization. in SK Jones (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 2725, pp. 589-607, Metrology, Inspection, and Process Control for Microlithography X, Santa Clara, CA, USA, 11/3/96.
Dixson R, Schneir J, McWaid TH, Sullivan NT, Tsai VW, Zaidi SH et al. Toward accurate linewidth metrology using atomic force microscopy and tip characterization. In Jones SK, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2725. 1996. p. 589-607
Dixson, Ronald ; Schneir, Jason ; McWaid, Thomas H. ; Sullivan, Neal T. ; Tsai, Vincent W. ; Zaidi, Saleem H. ; Brueck, Steven R. / Toward accurate linewidth metrology using atomic force microscopy and tip characterization. Proceedings of SPIE - The International Society for Optical Engineering. editor / Susan K. Jones. Vol. 2725 1996. pp. 589-607
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