The effect of isopropyl alcohol on anisotropic etched silicon for the fabrication of microheater chamber

Norihan Abdul Hamid, Burhanuddin Yeop Majlis, Jumril Yunas, Mimiwaty Mohd Noor

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

In bulk micromachining technology, anisotropic etching process has been one of the most popular processes in creating 3-dimensional MEMS structure, due to its simple and low cost process techniques. This paper presents the investigation of isopropyl alcohol (IPA) effect on anisotropic etched silicon surface of microheater chamber. The aim of the study is to find the optimal etch solution composition which will produce a smooth etched surface, low lateral etch (undercutting) effect and controllable etching rate. The etching process was carried out at with various potassium hydroxide (KOH) concentrations by adding various IPA compositions in the etchant solution. The effects of the solution were observed for several temperature conditions ranging from 50°C to 80°C. From the experimental results, it was observed that surface roughness and etch rate are highly dependent on the temperature, etchant composition and IPA concentrations in the solution. It can also be concluded that the addition of an appropriate IPA concentration provide a simple method in achieving a smooth and controlled etching of silicon substrate that plays an important factor in the fabrication of micro-heater chamber.

Original languageEnglish
Title of host publication2012 10th IEEE International Conference on Semiconductor Electronics, ICSE 2012 - Proceedings
Pages210-213
Number of pages4
DOIs
Publication statusPublished - 2012
Event2012 10th IEEE International Conference on Semiconductor Electronics, ICSE 2012 - Kuala Lumpur
Duration: 19 Sep 201221 Sep 2012

Other

Other2012 10th IEEE International Conference on Semiconductor Electronics, ICSE 2012
CityKuala Lumpur
Period19/9/1221/9/12

Fingerprint

Alcohols
Fabrication
Etching
Silicon
Chemical analysis
Anisotropic etching
Potassium hydroxide
Micromachining
MEMS
Surface roughness
Temperature
Substrates
Costs

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Hamid, N. A., Yeop Majlis, B., Yunas, J., & Noor, M. M. (2012). The effect of isopropyl alcohol on anisotropic etched silicon for the fabrication of microheater chamber. In 2012 10th IEEE International Conference on Semiconductor Electronics, ICSE 2012 - Proceedings (pp. 210-213). [6417125] https://doi.org/10.1109/SMElec.2012.6417125

The effect of isopropyl alcohol on anisotropic etched silicon for the fabrication of microheater chamber. / Hamid, Norihan Abdul; Yeop Majlis, Burhanuddin; Yunas, Jumril; Noor, Mimiwaty Mohd.

2012 10th IEEE International Conference on Semiconductor Electronics, ICSE 2012 - Proceedings. 2012. p. 210-213 6417125.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Hamid, NA, Yeop Majlis, B, Yunas, J & Noor, MM 2012, The effect of isopropyl alcohol on anisotropic etched silicon for the fabrication of microheater chamber. in 2012 10th IEEE International Conference on Semiconductor Electronics, ICSE 2012 - Proceedings., 6417125, pp. 210-213, 2012 10th IEEE International Conference on Semiconductor Electronics, ICSE 2012, Kuala Lumpur, 19/9/12. https://doi.org/10.1109/SMElec.2012.6417125
Hamid NA, Yeop Majlis B, Yunas J, Noor MM. The effect of isopropyl alcohol on anisotropic etched silicon for the fabrication of microheater chamber. In 2012 10th IEEE International Conference on Semiconductor Electronics, ICSE 2012 - Proceedings. 2012. p. 210-213. 6417125 https://doi.org/10.1109/SMElec.2012.6417125
Hamid, Norihan Abdul ; Yeop Majlis, Burhanuddin ; Yunas, Jumril ; Noor, Mimiwaty Mohd. / The effect of isopropyl alcohol on anisotropic etched silicon for the fabrication of microheater chamber. 2012 10th IEEE International Conference on Semiconductor Electronics, ICSE 2012 - Proceedings. 2012. pp. 210-213
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