Submicrometer lithographic alignment and overlay strategies

Saleem H. Zaidi, S. S H Naqvi, S. R J Brueck

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Inter-mask-level alignment and overlay measurements are becoming more challenging as new generations of lithography progress to critical dimensions well below a micrometer. Registration requirements are typically a small fraction (approx. 20%) of the critical dimension. Despite the importance of alignment to the realization of future generations of lithography, relatively little effort has been expended in contrast to the large body of work on new source and photoresist technologies. Moire techniques are shown to be an effective technique for alignment and overlay registration to well below a micrometer. Initial experiments are presented for several promising moire metrology techniques which are shown to be sufficiently precise to resolve two gratings with periods differing by less than 0.1 nm. A high-resolution Si-based optical position sensor, which relies on electronic transport mechanisms, rather than optical phase information, is also discussed in the context of submicrometer alignment.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsRichard B. Hoover, Arthur B.C.Jr. Walker
PublisherPubl by Int Soc for Optical Engineering
Pages245-255
Number of pages11
Volume1343
Publication statusPublished - 1991
Externally publishedYes
EventX-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography - San Diego, CA, USA
Duration: 9 Jul 199013 Jul 1990

Other

OtherX-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography
CitySan Diego, CA, USA
Period9/7/9013/7/90

Fingerprint

alignment
Lithography
micrometers
lithography
Photoresists
photoresists
metrology
Masks
masks
gratings
requirements
high resolution
sensors
Sensors
electronics
Experiments

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Zaidi, S. H., Naqvi, S. S. H., & Brueck, S. R. J. (1991). Submicrometer lithographic alignment and overlay strategies. In R. B. Hoover, & A. B. C. J. Walker (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 1343, pp. 245-255). Publ by Int Soc for Optical Engineering.

Submicrometer lithographic alignment and overlay strategies. / Zaidi, Saleem H.; Naqvi, S. S H; Brueck, S. R J.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Richard B. Hoover; Arthur B.C.Jr. Walker. Vol. 1343 Publ by Int Soc for Optical Engineering, 1991. p. 245-255.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zaidi, SH, Naqvi, SSH & Brueck, SRJ 1991, Submicrometer lithographic alignment and overlay strategies. in RB Hoover & ABCJ Walker (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 1343, Publ by Int Soc for Optical Engineering, pp. 245-255, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, San Diego, CA, USA, 9/7/90.
Zaidi SH, Naqvi SSH, Brueck SRJ. Submicrometer lithographic alignment and overlay strategies. In Hoover RB, Walker ABCJ, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 1343. Publ by Int Soc for Optical Engineering. 1991. p. 245-255
Zaidi, Saleem H. ; Naqvi, S. S H ; Brueck, S. R J. / Submicrometer lithographic alignment and overlay strategies. Proceedings of SPIE - The International Society for Optical Engineering. editor / Richard B. Hoover ; Arthur B.C.Jr. Walker. Vol. 1343 Publ by Int Soc for Optical Engineering, 1991. pp. 245-255
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