Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces

Siti Kudnie Sahari, Muhammad Kashif, Marini Sawawi, Nik Amni Fathi Nik Zaini Fathi, Azrul Azlan Hamzah, Burhanuddin Yeop Majlis, Norsuzailina Muhammad Sutan, Rohana Sapawi, Kuryati Kipli, Nurul Atiqah Abdul Halim, Nazreen Junaidi, Sharifah Masniah Wan Masra

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The different cleaning solution; HCl and HF solution are used to remove the suboxide and oxide component on Ge surface. The HCl cleaning results chlorine (Cl) termination on Ge surface whereas no Fluorine (F) termination was observed just after HF cleaning. The growth of Ge oxide is studied after treated with HCl cleaning on two surface orientations; (100) and (111), respectively in dry oxygen ambient and cleanroom air by spectroscopic ellipsometry (SE) and X-ray photoelectron spectroscopy (XPS). A clear step and terrace trend was observed for the oxidation growth of Ge (100) and Ge (111) in dry oxygen ambient compared to in clean room air. This trend shows the difference in surface reaction of Ge oxidation as humidity varies. The stability of chlorine termination of Ge (111) than Ge (100) explains the slower growth of oxidation in dry oxygen ambient.

Original languageEnglish
Article number05005
JournalMATEC Web of Conferences
Volume87
DOIs
Publication statusPublished - 2017

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Chlorine
Cleaning
Oxygen
Oxidation
Oxides
Clean rooms
Fluorine
Spectroscopic ellipsometry
Surface reactions
Air
Atmospheric humidity
X ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Chemistry(all)
  • Engineering(all)
  • Materials Science(all)

Cite this

Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces. / Sahari, Siti Kudnie; Kashif, Muhammad; Sawawi, Marini; Fathi, Nik Amni Fathi Nik Zaini; Hamzah, Azrul Azlan; Yeop Majlis, Burhanuddin; Sutan, Norsuzailina Muhammad; Sapawi, Rohana; Kipli, Kuryati; Halim, Nurul Atiqah Abdul; Junaidi, Nazreen; Masra, Sharifah Masniah Wan.

In: MATEC Web of Conferences, Vol. 87, 05005, 2017.

Research output: Contribution to journalArticle

Sahari, SK, Kashif, M, Sawawi, M, Fathi, NAFNZ, Hamzah, AA, Yeop Majlis, B, Sutan, NM, Sapawi, R, Kipli, K, Halim, NAA, Junaidi, N & Masra, SMW 2017, 'Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces', MATEC Web of Conferences, vol. 87, 05005. https://doi.org/10.1051/matecconf/20178705005
Sahari, Siti Kudnie ; Kashif, Muhammad ; Sawawi, Marini ; Fathi, Nik Amni Fathi Nik Zaini ; Hamzah, Azrul Azlan ; Yeop Majlis, Burhanuddin ; Sutan, Norsuzailina Muhammad ; Sapawi, Rohana ; Kipli, Kuryati ; Halim, Nurul Atiqah Abdul ; Junaidi, Nazreen ; Masra, Sharifah Masniah Wan. / Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces. In: MATEC Web of Conferences. 2017 ; Vol. 87.
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AU - Fathi, Nik Amni Fathi Nik Zaini

AU - Hamzah, Azrul Azlan

AU - Yeop Majlis, Burhanuddin

AU - Sutan, Norsuzailina Muhammad

AU - Sapawi, Rohana

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AU - Halim, Nurul Atiqah Abdul

AU - Junaidi, Nazreen

AU - Masra, Sharifah Masniah Wan

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AB - The different cleaning solution; HCl and HF solution are used to remove the suboxide and oxide component on Ge surface. The HCl cleaning results chlorine (Cl) termination on Ge surface whereas no Fluorine (F) termination was observed just after HF cleaning. The growth of Ge oxide is studied after treated with HCl cleaning on two surface orientations; (100) and (111), respectively in dry oxygen ambient and cleanroom air by spectroscopic ellipsometry (SE) and X-ray photoelectron spectroscopy (XPS). A clear step and terrace trend was observed for the oxidation growth of Ge (100) and Ge (111) in dry oxygen ambient compared to in clean room air. This trend shows the difference in surface reaction of Ge oxidation as humidity varies. The stability of chlorine termination of Ge (111) than Ge (100) explains the slower growth of oxidation in dry oxygen ambient.

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