Slotted capacitive microphone with sputtered aluminum diaphragm and photoresist sacrificial layer

Bahram Azizollah Ganji, Burhanuddin Yeop Majlis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

In this paper, we have fabricated a new microphone using aluminum (Al) slotted perforated diaphragm and back plate electrode, and photoresist (AZ1500) sacrificial layer on silicon wafer. The novelty of this method relies on aluminum diaphragm includes some slots to reduce the effect of residual stress and stiffness of diaphragm for increasing the microphone sensitivity. The acoustic holes are made on diaphragm to reduce the air damping, and avoid the disadvantages of non standard silicon processing for making back chamber and holes in back plate, which are more complex and expensive. Photoresist sacrificial layer is easy to deposition by spin coater and also easy to release by acetone. Moreover, acetone has a high selectivity to resist compared to silicon oxide and Al, thus it completely removes sacrificial resist without incurring significant damage silicon oxide and Al. The measured zero bias capacitance is 17.5 pF, and its pull-in voltage is 25 V. The microphone has been tested with external amplifier and speaker, the external amplifier was able to detect the sound waves from microphone on speaker and oscilloscope. The maximum amplitude of output speech signal of amplifier is 45 mV, and the maximum output of MEMS microphone is 1.125 μV.

Original languageEnglish
Title of host publicationIEEE International Conference on Semiconductor Electronics, Proceedings, ICSE
Pages267-271
Number of pages5
DOIs
Publication statusPublished - 2010
Event2010 IEEE International Conference on Semiconductor Electronics, ICSE 2010 - Melaka
Duration: 28 Jun 201030 Jun 2010

Other

Other2010 IEEE International Conference on Semiconductor Electronics, ICSE 2010
CityMelaka
Period28/6/1030/6/10

Fingerprint

Photoresists
Microphones
Diaphragms
Aluminum
Aluminum Oxide
Silicon oxides
Acetone
Silicon
Silicon wafers
MEMS
Residual stresses
Capacitance
Damping
Acoustics
Stiffness
Acoustic waves
Electrodes
Electric potential
Processing
Air

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

Cite this

Ganji, B. A., & Yeop Majlis, B. (2010). Slotted capacitive microphone with sputtered aluminum diaphragm and photoresist sacrificial layer. In IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE (pp. 267-271). [5549497] https://doi.org/10.1109/SMELEC.2010.5549497

Slotted capacitive microphone with sputtered aluminum diaphragm and photoresist sacrificial layer. / Ganji, Bahram Azizollah; Yeop Majlis, Burhanuddin.

IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. 2010. p. 267-271 5549497.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Ganji, BA & Yeop Majlis, B 2010, Slotted capacitive microphone with sputtered aluminum diaphragm and photoresist sacrificial layer. in IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE., 5549497, pp. 267-271, 2010 IEEE International Conference on Semiconductor Electronics, ICSE 2010, Melaka, 28/6/10. https://doi.org/10.1109/SMELEC.2010.5549497
Ganji BA, Yeop Majlis B. Slotted capacitive microphone with sputtered aluminum diaphragm and photoresist sacrificial layer. In IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. 2010. p. 267-271. 5549497 https://doi.org/10.1109/SMELEC.2010.5549497
Ganji, Bahram Azizollah ; Yeop Majlis, Burhanuddin. / Slotted capacitive microphone with sputtered aluminum diaphragm and photoresist sacrificial layer. IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. 2010. pp. 267-271
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