Simulation for deposition of ZnO thin film layer by kinetic Monte Carlo method

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Kinetic Monte Carlo method was used to simulate the deposition of ZnO thin film layers. For this simulation, parameters for atom absorption, desorption and surface diffusion were incorporated to perform more realistic model of deposition. A new approach was used where the diffusion process was integrated as part of the deposition process. Simulations were carried out at different substrate temperatures. Two- and three-dimensional growth mechanisms were simulated using this model. Surface roughness can be estimated from the ratio of the atoms at the edge of the islands to the total surface sites. The number of Zn and O adatoms on the surface as a time function was analysed.

Original languageEnglish
Pages (from-to)135-138
Number of pages4
JournalMaterials Research Innovations
Volume13
Issue number3
DOIs
Publication statusPublished - Sep 2009

Fingerprint

Monte Carlo method
Monte Carlo methods
Thin films
Kinetics
kinetics
thin films
Atoms
Adatoms
time functions
Surface diffusion
simulation
surface diffusion
adatoms
atoms
Desorption
surface roughness
Surface roughness
desorption
Substrates
Temperature

Keywords

  • Deposition
  • Epitaxial growth
  • Kinetic Monte Carlo
  • Simulation
  • Surface roughness
  • ZnO

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Simulation for deposition of ZnO thin film layer by kinetic Monte Carlo method. / Dee, Chang Fu; Lee, J. D.; Sow, C. H.; Yeop Majlis, Burhanuddin; Hamzah, Azrul Azlan; Abdullah, Huda; Lee, S. K.

In: Materials Research Innovations, Vol. 13, No. 3, 09.2009, p. 135-138.

Research output: Contribution to journalArticle

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