Scalable Si nanofabrication technology

Saleem H. Zaidi, An Shyang Chu, Bernardo Martinez-Tovar, Kenneth Jungling, S. R J Brueck

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Mesoscopic linewidth Si grating formations manufactured by integrating laser interferometric lithography with inordinately anisotropic KOH etching and thermal oxidation were analyzed. Thinner structures at 20 nm were produced by dry oxidation. A scanning microscope was used to provide micrographic information of the Si grating structures.

Original languageEnglish
Title of host publicationConference Proceedings - Lasers and Electro-Optics Society Annual Meeting
Place of PublicationPiscataway, NJ, United States
PublisherPubl by IEEE
Pages392-393
Number of pages2
Volume8
ISBN (Print)0780319710
Publication statusPublished - 1994
Externally publishedYes
EventProceedings of the Conference on Lasers and Electro-Optics - Anaheim, CA, USA
Duration: 8 May 199413 May 1994

Other

OtherProceedings of the Conference on Lasers and Electro-Optics
CityAnaheim, CA, USA
Period8/5/9413/5/94

Fingerprint

Nanotechnology
Anisotropic etching
Oxidation
Linewidth
Lithography
Microscopes
Scanning
Lasers
Hot Temperature

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering
  • Engineering(all)

Cite this

Zaidi, S. H., Chu, A. S., Martinez-Tovar, B., Jungling, K., & Brueck, S. R. J. (1994). Scalable Si nanofabrication technology. In Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting (Vol. 8, pp. 392-393). Piscataway, NJ, United States: Publ by IEEE.

Scalable Si nanofabrication technology. / Zaidi, Saleem H.; Chu, An Shyang; Martinez-Tovar, Bernardo; Jungling, Kenneth; Brueck, S. R J.

Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting. Vol. 8 Piscataway, NJ, United States : Publ by IEEE, 1994. p. 392-393.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zaidi, SH, Chu, AS, Martinez-Tovar, B, Jungling, K & Brueck, SRJ 1994, Scalable Si nanofabrication technology. in Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting. vol. 8, Publ by IEEE, Piscataway, NJ, United States, pp. 392-393, Proceedings of the Conference on Lasers and Electro-Optics, Anaheim, CA, USA, 8/5/94.
Zaidi SH, Chu AS, Martinez-Tovar B, Jungling K, Brueck SRJ. Scalable Si nanofabrication technology. In Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting. Vol. 8. Piscataway, NJ, United States: Publ by IEEE. 1994. p. 392-393
Zaidi, Saleem H. ; Chu, An Shyang ; Martinez-Tovar, Bernardo ; Jungling, Kenneth ; Brueck, S. R J. / Scalable Si nanofabrication technology. Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting. Vol. 8 Piscataway, NJ, United States : Publ by IEEE, 1994. pp. 392-393
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