Research on effect of high energy implant to resist thickness

Hazian Mamat, NurFirdaus A. Rahim, Mohd Zahrin A Wahab, Azman Jalar @ Jalil

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The experiment discusses the issue of high-energy implant to the resist thickness and how the resist etched away during implantation process. The resist that is use as a mask or material to block the dopant ion such as Phosphorous, Boron or Arsenic introduces into silicon substrate. It is a common practice by all semiconductor industrial players to use photoresist as their protection on desired area in which purposely set as non-implanted area. The research benefits the engineer on determine the sufficient photoresist thickness for specific implant energy.

Original languageEnglish
Title of host publicationAdvanced Materials Research
Pages718-722
Number of pages5
Volume230-232
DOIs
Publication statusPublished - 2011
Externally publishedYes
Event2011 International Conference on Frontiers of Manufacturing Science and Measuring Technology, ICFMM 2011 - Chongqing
Duration: 23 Jun 201124 Jun 2011

Publication series

NameAdvanced Materials Research
Volume230-232
ISSN (Print)10226680

Other

Other2011 International Conference on Frontiers of Manufacturing Science and Measuring Technology, ICFMM 2011
CityChongqing
Period23/6/1124/6/11

Fingerprint

Photoresists
Arsenic
Boron
Masks
Doping (additives)
Semiconductor materials
Engineers
Silicon
Ions
Substrates
Experiments

Keywords

  • FESEM
  • Implant dos
  • Implant energy
  • Implanter
  • Photoresist
  • Photoresist thickness

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Mamat, H., Rahim, N. A., Wahab, M. Z. A., & Jalar @ Jalil, A. (2011). Research on effect of high energy implant to resist thickness. In Advanced Materials Research (Vol. 230-232, pp. 718-722). (Advanced Materials Research; Vol. 230-232). https://doi.org/10.4028/www.scientific.net/AMR.230-232.718

Research on effect of high energy implant to resist thickness. / Mamat, Hazian; Rahim, NurFirdaus A.; Wahab, Mohd Zahrin A; Jalar @ Jalil, Azman.

Advanced Materials Research. Vol. 230-232 2011. p. 718-722 (Advanced Materials Research; Vol. 230-232).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Mamat, H, Rahim, NA, Wahab, MZA & Jalar @ Jalil, A 2011, Research on effect of high energy implant to resist thickness. in Advanced Materials Research. vol. 230-232, Advanced Materials Research, vol. 230-232, pp. 718-722, 2011 International Conference on Frontiers of Manufacturing Science and Measuring Technology, ICFMM 2011, Chongqing, 23/6/11. https://doi.org/10.4028/www.scientific.net/AMR.230-232.718
Mamat H, Rahim NA, Wahab MZA, Jalar @ Jalil A. Research on effect of high energy implant to resist thickness. In Advanced Materials Research. Vol. 230-232. 2011. p. 718-722. (Advanced Materials Research). https://doi.org/10.4028/www.scientific.net/AMR.230-232.718
Mamat, Hazian ; Rahim, NurFirdaus A. ; Wahab, Mohd Zahrin A ; Jalar @ Jalil, Azman. / Research on effect of high energy implant to resist thickness. Advanced Materials Research. Vol. 230-232 2011. pp. 718-722 (Advanced Materials Research).
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