ProTEK PSB as Biotechnology Photosensitive Protection Mask on 3C-SiC-on-Si in MEMS Sensor

N. Marsi, Burhanuddin Yeop Majlis, F. Mohd-Yasin, Azrul Azlan Hamzah, A. Z Mohd Rus

Research output: Contribution to journalArticle

Abstract

This project presents the fabrication of MEMS employing a cubic silicon carbide (3C- SiC) on silicon wafer using newly developed ProTEK PSB as biotechnology photosensitive protection mask. This new biotechnology can reduce the number of processes and simplify the process flow with minimal impact on overall undercut performance. The 680 pm thick wafer is back-etched, leaving the 3C-SiC thin film with a thickness of 1.0 μm as the flexible diaphragm to detect pressure. The effect of the new coating of ProTEK PSB on different KOH solvents were investigated depending on various factors such as development time, final cure temperature and the thickness of the ProTEK PSB deposited layer. It is found that 6.174 μm thickness of ProTEK PSB offers some possibility of reducing the processing time compared to silicon nitride etch masks in KOH (55%wt, 80°C). The new ProTEK PSB biotechnology photosensitive protection mask indicates good stability and sustains its performance in different treatments under KOH and IPA for 8 hours. This work also revealed that the fabrication of MEMS sensors using the new biotechnology photosensitive protection mask provides a simple assembly approach and reduces manufacturing costs. The MEMS sensor can operate up to 500°C as indicated under the sensitivity of 0.826 pF/MPa with nonlinearity and hysteresis of 0.61% and 3.13%, respectively.

Original languageEnglish
Article number012093
JournalIOP Conference Series: Materials Science and Engineering
Volume160
Issue number1
DOIs
Publication statusPublished - 7 Dec 2016

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Biotechnology
MEMS
Masks
Sensors
Fabrication
Control nonlinearities
Diaphragms
Silicon nitride
Silicon wafers
Silicon carbide
Hysteresis
Thin films
Coatings
Processing
Costs
Temperature

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

Cite this

ProTEK PSB as Biotechnology Photosensitive Protection Mask on 3C-SiC-on-Si in MEMS Sensor. / Marsi, N.; Yeop Majlis, Burhanuddin; Mohd-Yasin, F.; Hamzah, Azrul Azlan; Rus, A. Z Mohd.

In: IOP Conference Series: Materials Science and Engineering, Vol. 160, No. 1, 012093, 07.12.2016.

Research output: Contribution to journalArticle

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