Properties of a-C

H films deposited in CH4H2 and CH4he DC plasma

Rozidawati Awang, Saadah Abdul Rahman

Research output: Contribution to journalArticle

Abstract

Hydrogenated amorphous carbon (a-C:H) films were deposited using direct-current plasma enhanced chemical vapor deposition (DC PECVD) process. The resulting film properties were studied with respect to the introduction of hydrogen (H2) and helium (He) in methane (CH4) plasma. The analysis techniques used to assess the film properties included optical transmission spectroscopy, Fourier transmission infrared (FTIR) spectroscopy and photoluminescence (PL) spectroscopy. Hydrogen dilution has significant effect on the deposition rate and optical band gap (Eg) of the film but helium dilution produces insignificant effects on these parameters. However, the hydrogen content in the film decreases steeply to a saturation value with increase in helium dilution. Increase in dilution of CH4 by both H and He gases result in decrease in PL efficiency.

Original languageEnglish
Pages (from-to)15-18
Number of pages4
JournalInternational Journal of Nanoscience
Volume8
Issue number1-2
Publication statusPublished - Feb 2009

Fingerprint

Helium
dilution
direct current
Dilution
Plasmas
Hydrogen
Spectrum Analysis
helium
hydrogen
helium film
photoluminescence
Methane
Saturation (materials composition)
Photoluminescence spectroscopy
spectroscopy
Amorphous carbon
Optical band gaps
Plasma enhanced chemical vapor deposition
Light transmission
Deposition rates

Keywords

  • A-C:H
  • E
  • FTIR
  • Hydrogen and helium dilution
  • PL

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Computer Science Applications
  • Materials Science(all)
  • Condensed Matter Physics
  • Biotechnology
  • Bioengineering

Cite this

Properties of a-C : H films deposited in CH4H2 and CH4he DC plasma. / Awang, Rozidawati; Rahman, Saadah Abdul.

In: International Journal of Nanoscience, Vol. 8, No. 1-2, 02.2009, p. 15-18.

Research output: Contribution to journalArticle

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