Process modeling, optimization and characterization of silicon 〈100〉 optical waveguides by anisotropic wet etching

H. Hazura, A. R. Hanim, B. Mardiana, Sahbudin Shaari, P. Susthitha Menon N V Visvanathan

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We present a detailed fabrication process of silicon optical waveguide with a depth of 4μm via simulation and experiment. An anisotropic wet etching using Potassium Hydroxide (KOH) solutions was selected to study the influence of major fabrication parameters such as etch rate, oxidation time and development time to the fabrication performance. The fabrication of the silicon waveguide with the orientation of 〈100〉 was modeled using ATHENA from 2D Silvaco software and was later compared with the actual fabricated device. Etching time of 4 minutes was required to etch the Si to the depth of 4μm to obtain a perfectly trapeizoidal optical waveguide structure. Our results show that the simulation model is trustworthy to predict the performance of the practical anisotropic wet etching fabrication process. The silicon-based waveguide components are targeted to be employed in realizing future photonic devices such as optical modulators.

Original languageEnglish
Title of host publicationAdvanced Materials Research
Pages4295-4299
Number of pages5
Volume403-408
DOIs
Publication statusPublished - 2012
Event2011 7th International Conference on MEMS, NANO and Smart Systems, ICMENS 2011 - Kuala Lumpur
Duration: 4 Nov 20116 Nov 2011

Publication series

NameAdvanced Materials Research
Volume403-408
ISSN (Print)10226680

Other

Other2011 7th International Conference on MEMS, NANO and Smart Systems, ICMENS 2011
CityKuala Lumpur
Period4/11/116/11/11

Fingerprint

Anisotropic etching
Wet etching
Optical waveguides
Fabrication
Silicon
Waveguide components
Potassium hydroxide
Photonic devices
Light modulators
Etching
Waveguides
Oxidation
Experiments

Keywords

  • Anisotropic chemical etching
  • Optical waveguide fabrication
  • Silicon photonics

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Hazura, H., Hanim, A. R., Mardiana, B., Shaari, S., & N V Visvanathan, P. S. M. (2012). Process modeling, optimization and characterization of silicon 〈100〉 optical waveguides by anisotropic wet etching. In Advanced Materials Research (Vol. 403-408, pp. 4295-4299). (Advanced Materials Research; Vol. 403-408). https://doi.org/10.4028/www.scientific.net/AMR.403-408.4295

Process modeling, optimization and characterization of silicon 〈100〉 optical waveguides by anisotropic wet etching. / Hazura, H.; Hanim, A. R.; Mardiana, B.; Shaari, Sahbudin; N V Visvanathan, P. Susthitha Menon.

Advanced Materials Research. Vol. 403-408 2012. p. 4295-4299 (Advanced Materials Research; Vol. 403-408).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Hazura, H, Hanim, AR, Mardiana, B, Shaari, S & N V Visvanathan, PSM 2012, Process modeling, optimization and characterization of silicon 〈100〉 optical waveguides by anisotropic wet etching. in Advanced Materials Research. vol. 403-408, Advanced Materials Research, vol. 403-408, pp. 4295-4299, 2011 7th International Conference on MEMS, NANO and Smart Systems, ICMENS 2011, Kuala Lumpur, 4/11/11. https://doi.org/10.4028/www.scientific.net/AMR.403-408.4295
Hazura H, Hanim AR, Mardiana B, Shaari S, N V Visvanathan PSM. Process modeling, optimization and characterization of silicon 〈100〉 optical waveguides by anisotropic wet etching. In Advanced Materials Research. Vol. 403-408. 2012. p. 4295-4299. (Advanced Materials Research). https://doi.org/10.4028/www.scientific.net/AMR.403-408.4295
Hazura, H. ; Hanim, A. R. ; Mardiana, B. ; Shaari, Sahbudin ; N V Visvanathan, P. Susthitha Menon. / Process modeling, optimization and characterization of silicon 〈100〉 optical waveguides by anisotropic wet etching. Advanced Materials Research. Vol. 403-408 2012. pp. 4295-4299 (Advanced Materials Research).
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