Plasma implantation of silicon solar cells for emitter and localized BSF formation

Rajiv Prinja, David Modisette, Rich Winder, Nowshad Amin, Kamaruzzaman Sopian, Saleem H. Zaidi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

It has been estimated that 1 MWp cell production requires almost 10 million liters of de-ionized water, not including chemicals such as HF, HCl, and NaOH. Consideration of the current industry trends, including use of thinner Si wafers and growing incompatibility screen-printed Al-alloyed back surface filed (BSF) formation on increasingly thinner wafers due to wafer warpage and increasing Al costs, also reinforce the need to develop alternate, low-cost manufacturing processes. Dry processing approaches are well-placed to addressing these issues. For example, plasma texturing can be modified to remove saw damage as well as texture the surface in one step. Similarly, plasma implantation of textured surfaces offers an alternate, low-cost approach to form front and back surface doped layers. We report on design and fabrication of a simple, low-cost plasma immersion implantation system. This system is capable of implanting upto 6″-diameter wafers. We have demonstrated of implantation in few minutes with implant activation using long furnace anneals. The junction depths in 0.1-0.4-μm range have been achieved. By optimizing dose, implant energy, and activation profile, we expect to fabricate high efficiency solar cells.

Original languageEnglish
Title of host publicationConference Record of the IEEE Photovoltaic Specialists Conference
DOIs
Publication statusPublished - 2008
Event33rd IEEE Photovoltaic Specialists Conference, PVSC 2008 - San Diego, CA
Duration: 11 May 200816 May 2008

Other

Other33rd IEEE Photovoltaic Specialists Conference, PVSC 2008
CitySan Diego, CA
Period11/5/0816/5/08

Fingerprint

Silicon solar cells
Plasmas
Costs
Chemical activation
Texturing
Ion implantation
Solar cells
Furnaces
Textures
Fabrication
Processing
Water
Industry

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering

Cite this

Prinja, R., Modisette, D., Winder, R., Amin, N., Sopian, K., & Zaidi, S. H. (2008). Plasma implantation of silicon solar cells for emitter and localized BSF formation. In Conference Record of the IEEE Photovoltaic Specialists Conference [4922684] https://doi.org/10.1109/PVSC.2008.4922684

Plasma implantation of silicon solar cells for emitter and localized BSF formation. / Prinja, Rajiv; Modisette, David; Winder, Rich; Amin, Nowshad; Sopian, Kamaruzzaman; Zaidi, Saleem H.

Conference Record of the IEEE Photovoltaic Specialists Conference. 2008. 4922684.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Prinja, R, Modisette, D, Winder, R, Amin, N, Sopian, K & Zaidi, SH 2008, Plasma implantation of silicon solar cells for emitter and localized BSF formation. in Conference Record of the IEEE Photovoltaic Specialists Conference., 4922684, 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008, San Diego, CA, 11/5/08. https://doi.org/10.1109/PVSC.2008.4922684
Prinja R, Modisette D, Winder R, Amin N, Sopian K, Zaidi SH. Plasma implantation of silicon solar cells for emitter and localized BSF formation. In Conference Record of the IEEE Photovoltaic Specialists Conference. 2008. 4922684 https://doi.org/10.1109/PVSC.2008.4922684
Prinja, Rajiv ; Modisette, David ; Winder, Rich ; Amin, Nowshad ; Sopian, Kamaruzzaman ; Zaidi, Saleem H. / Plasma implantation of silicon solar cells for emitter and localized BSF formation. Conference Record of the IEEE Photovoltaic Specialists Conference. 2008.
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