Photosensitive phospohorus-doped boron-codoped silica planar waveguide for waveguide Bragg grating prepared by spin coating

Mohd Syuhaimi Ab Rahman, Sahbudin Shaari

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Phosphorous doped silica layers are grown from terraethylorthosilicate (TEOS), phosphoric acid and PBF polymer, with spin coating technique on silica glass. The phosphorus-doped and boron-codoped photosensitive silica waveguide samples show index modulation around 1 × 10 -4 for thickness between 3 μm to 8 μm. The refractive index range is between 1.51 to 1.54 which is dependent on the coating parameters and concentration of phosphoric acid. Photosensitivity test and treatment are performed using a 366 nm UV source, with 0.36 mW/cm 2 power at pulse rate of 50 Hz. All samples show a decrease in refractive indices under the UV exposure. They begin to saturate after first 30-60 minutes in treatment. Further UV exposure will slowly increase again the refractive index. It is estimated that, with a laser source power from ArF and KrF of about 10 mW, the Bragg grating writing duration will be in between 20 to 30 second. The samples were also thermally treated to increase the index modulation by the factor of 10.

Original languageEnglish
Title of host publicationIEEE International Conference on Semiconductor Electronics, Proceedings, ICSE
Pages450-454
Number of pages5
Publication statusPublished - 2002
Event2002 5th IEEE International Conference on Semiconductor Electronics, ICSE 2002 - Penang
Duration: 19 Dec 200221 Dec 2002

Other

Other2002 5th IEEE International Conference on Semiconductor Electronics, ICSE 2002
CityPenang
Period19/12/0221/12/02

Fingerprint

Bragg gratings
Planar waveguides
Boron
Spin coating
Silicon Dioxide
Refractive index
Waveguides
Silica
Phosphoric acid
Modulation
Photosensitivity
Coating techniques
Fused silica
Phosphorus
Polymers
Coatings
Lasers
phosphoric acid

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

Cite this

Ab Rahman, M. S., & Shaari, S. (2002). Photosensitive phospohorus-doped boron-codoped silica planar waveguide for waveguide Bragg grating prepared by spin coating. In IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE (pp. 450-454). [1217863]

Photosensitive phospohorus-doped boron-codoped silica planar waveguide for waveguide Bragg grating prepared by spin coating. / Ab Rahman, Mohd Syuhaimi; Shaari, Sahbudin.

IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. 2002. p. 450-454 1217863.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Ab Rahman, MS & Shaari, S 2002, Photosensitive phospohorus-doped boron-codoped silica planar waveguide for waveguide Bragg grating prepared by spin coating. in IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE., 1217863, pp. 450-454, 2002 5th IEEE International Conference on Semiconductor Electronics, ICSE 2002, Penang, 19/12/02.
Ab Rahman MS, Shaari S. Photosensitive phospohorus-doped boron-codoped silica planar waveguide for waveguide Bragg grating prepared by spin coating. In IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. 2002. p. 450-454. 1217863
Ab Rahman, Mohd Syuhaimi ; Shaari, Sahbudin. / Photosensitive phospohorus-doped boron-codoped silica planar waveguide for waveguide Bragg grating prepared by spin coating. IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. 2002. pp. 450-454
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