Photoluminescence of manufactured 1-D crystalline Si gratings

Saleem H. Zaidi, S. R J Brueck

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

An innovative fabrication process for forming 1-D, nanoscale linewidth grating and wire structures in (100) Si is reported. Scanning electron microscope and Raman scattering measurements demonstrate crystalline structures with widths as small as ∼ 1.5 nm. For structures ≲ 10 nm, room temperature photoluminescence measurements (257 nm excitation) show spectral peaks ∼ 380-500 nm. In contrast to the Raman scattering results, which show a definite correlation with structure widths, the PL spectra are relatively invariant as structure widths are reduced below 10 nm.

Original languageEnglish
Pages (from-to)264-268
Number of pages5
JournalOptics Communications
Volume135
Issue number4-6
Publication statusPublished - 15 Feb 1997
Externally publishedYes

Fingerprint

Raman scattering
Photoluminescence
gratings
Crystalline materials
photoluminescence
Linewidth
Raman spectra
Electron microscopes
Wire
Scanning
Fabrication
electron microscopes
wire
fabrication
scanning
room temperature
scattering
Temperature
excitation

Keywords

  • Raman scattering
  • Room temperature Si photoluminescence
  • Si quantum size effects

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Photoluminescence of manufactured 1-D crystalline Si gratings. / Zaidi, Saleem H.; Brueck, S. R J.

In: Optics Communications, Vol. 135, No. 4-6, 15.02.1997, p. 264-268.

Research output: Contribution to journalArticle

Zaidi, Saleem H. ; Brueck, S. R J. / Photoluminescence of manufactured 1-D crystalline Si gratings. In: Optics Communications. 1997 ; Vol. 135, No. 4-6. pp. 264-268.
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