Nd

YAG laser texturization on silicon surface

Nurul Huda Abdul Razak, Nowshad Amin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Monocrystalline silicon texturization will be elaborate in this paper as a new method for texturing silicon surface. Normally, silicon surface will textured by using wet chemical etched. Some of crystalline wafer is ineffective when using conventional methods, because the different crystallographic orientation of regions of diversified consequence. Conventional method which is wet chemical etched always shown not uniform texture. So, the texturization with laser will introduce as a promising method in reducing reflection on silicon surface. This is the reason for conducting this research. Field Emission Scanning Electron Microscopy (FESEM) and digital microscope are performed to evaluate the results. Texturization of monocrystalline silicon surface by using Pulsed Laser Nd:YAG was found to be promising method in terms to avoid chemical texturing etched method. Compared to the conventional texturing method, laser texturization is much more independent on grains crystallographic orientation. Higher homogeneity texture can be reached when using laser Nd:YAG compared with chemical or electrochemical methods. The heat affected area caused by material damages is related with presented method limitation implementation practically. However, one step of chemical etching will be used to remove the damages after laser texturization. The main reason conducted this new methods are to reduce reflectance from bare or polished silicon surface and adapt it into solar cell manufacturing process. This new methods are expected to gives high efficiency solar cells.

Original languageEnglish
Title of host publicationAdvanced Materials Research
Pages201-205
Number of pages5
Volume894
DOIs
Publication statusPublished - 2014
Event2014 4th International Conference on Advanced Materials Research, ICAMR 2014 - Macau
Duration: 22 Jan 201423 Jan 2014

Publication series

NameAdvanced Materials Research
Volume894
ISSN (Print)10226680

Other

Other2014 4th International Conference on Advanced Materials Research, ICAMR 2014
CityMacau
Period22/1/1423/1/14

Fingerprint

Texturing
Silicon
Lasers
Monocrystalline silicon
Solar cells
Textures
Pulsed lasers
Field emission
Etching
Microscopes
Crystalline materials
Scanning electron microscopy

Keywords

  • Crystalline silicon
  • Laser texturization
  • Photovoltaic
  • Silicon surface

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Razak, N. H. A., & Amin, N. (2014). Nd: YAG laser texturization on silicon surface. In Advanced Materials Research (Vol. 894, pp. 201-205). (Advanced Materials Research; Vol. 894). https://doi.org/10.4028/www.scientific.net/AMR.894.201

Nd : YAG laser texturization on silicon surface. / Razak, Nurul Huda Abdul; Amin, Nowshad.

Advanced Materials Research. Vol. 894 2014. p. 201-205 (Advanced Materials Research; Vol. 894).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Razak, NHA & Amin, N 2014, Nd: YAG laser texturization on silicon surface. in Advanced Materials Research. vol. 894, Advanced Materials Research, vol. 894, pp. 201-205, 2014 4th International Conference on Advanced Materials Research, ICAMR 2014, Macau, 22/1/14. https://doi.org/10.4028/www.scientific.net/AMR.894.201
Razak NHA, Amin N. Nd: YAG laser texturization on silicon surface. In Advanced Materials Research. Vol. 894. 2014. p. 201-205. (Advanced Materials Research). https://doi.org/10.4028/www.scientific.net/AMR.894.201
Razak, Nurul Huda Abdul ; Amin, Nowshad. / Nd : YAG laser texturization on silicon surface. Advanced Materials Research. Vol. 894 2014. pp. 201-205 (Advanced Materials Research).
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