Nanostructuring surfaces with slow multiply-charged ions

Ille C. Gebeshuber, Richard A P Smith, Sebastian Pleschko, Clemens Gruenberger, Katharina Kaska, Martin Fuersatz, Hannspeter Winter, Friedrich Aumayr

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

With the shrinking of semiconductor devices surface features and structuring become increasingly important. Generally, fast ions are used for modification of surfaces via ion beam writing. Their kinetic energy is not only dissipated close to the surface but also in deeper layers of the material. Associated radiation damage could become a problem in the production of novel 3D micro- and nanoelectromechanical systems (MEMS and NEMS). Slow (<1keV) multiply-charged ions as opposed to fast ions are a new tool for gentler structuring of surfaces at the nanometer-scale. The substrate is modified only at and slightly below the surface, opening the possibility of controlling electronic properties at the nanometer scale, vertically and horizontally. Materials under investigation are highly orientated pyrolytic graphite, single crystal insulators (quartz, mica, aluminum oxide), hydrogen-terminated single-crystal silicon, AsSe- and Se-glass and mylar foils. The materials modified by the ion irradiation are investigated with scanning probe microscopy (AFM, STM) in ultrahigh vacuum and in ambient conditions.

Original languageEnglish
Title of host publicationNanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings
Pages324-327
Number of pages4
Volume2006
DOIs
Publication statusPublished - 2006
Externally publishedYes
Event2006 IEEE Conference on Emerging Technologies - Nanoelectronics - Singapore
Duration: 10 Jan 200613 Jan 2006

Other

Other2006 IEEE Conference on Emerging Technologies - Nanoelectronics
CitySingapore
Period10/1/0613/1/06

Fingerprint

Ions
NEMS
MEMS
Single crystals
Scanning probe microscopy
Radiation damage
Mica
Ultrahigh vacuum
Semiconductor devices
Ion bombardment
Kinetic energy
Electronic properties
Metal foil
Ion beams
Quartz
Graphite
Aluminum
Glass
Silicon
Hydrogen

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Gebeshuber, I. C., Smith, R. A. P., Pleschko, S., Gruenberger, C., Kaska, K., Fuersatz, M., ... Aumayr, F. (2006). Nanostructuring surfaces with slow multiply-charged ions. In NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings (Vol. 2006, pp. 324-327). [1609739] https://doi.org/10.1109/NANOEL.2006.1609739

Nanostructuring surfaces with slow multiply-charged ions. / Gebeshuber, Ille C.; Smith, Richard A P; Pleschko, Sebastian; Gruenberger, Clemens; Kaska, Katharina; Fuersatz, Martin; Winter, Hannspeter; Aumayr, Friedrich.

NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings. Vol. 2006 2006. p. 324-327 1609739.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Gebeshuber, IC, Smith, RAP, Pleschko, S, Gruenberger, C, Kaska, K, Fuersatz, M, Winter, H & Aumayr, F 2006, Nanostructuring surfaces with slow multiply-charged ions. in NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings. vol. 2006, 1609739, pp. 324-327, 2006 IEEE Conference on Emerging Technologies - Nanoelectronics, Singapore, 10/1/06. https://doi.org/10.1109/NANOEL.2006.1609739
Gebeshuber IC, Smith RAP, Pleschko S, Gruenberger C, Kaska K, Fuersatz M et al. Nanostructuring surfaces with slow multiply-charged ions. In NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings. Vol. 2006. 2006. p. 324-327. 1609739 https://doi.org/10.1109/NANOEL.2006.1609739
Gebeshuber, Ille C. ; Smith, Richard A P ; Pleschko, Sebastian ; Gruenberger, Clemens ; Kaska, Katharina ; Fuersatz, Martin ; Winter, Hannspeter ; Aumayr, Friedrich. / Nanostructuring surfaces with slow multiply-charged ions. NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings. Vol. 2006 2006. pp. 324-327
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