Low-g area-changed MEMS accelerometer using bulk silicon technique

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A bulk micromachined accelerometer based on an area variation capacitive sensing for low-g applications was developed. The accelerometer was designed with ribbed-style fingers structure on the movable mass connected in parallel and suspended over stationary electrodes composed of differential comb fingers by means of suspension beams anchored onto the substrate. A folded, rigid truss suspension design with low spring constant and low cross-axis sensitivity was chosen. The simulation was performed using Coventorware software. A three-mask bulk micromachining wafer bonding fabrication process was utilized to realize the accelerometer. Silicon-on-glass was used to achieve high sensitivity and low mechanical noise while maintaining a simple structure. The general concept, main design considerations, fabrication procedure and performance of the resulted accelerometer was elaborated and presented. A linear relationship between the differential capacitance and acceleration was obtained. The accelerometer sensitivity was calculated to be 0.47 pF/g with an acceleration range of ±5 g.

Original languageEnglish
Pages (from-to)626-632
Number of pages7
JournalAmerican Journal of Applied Sciences
Volume5
Issue number6
Publication statusPublished - 2008

Fingerprint

Accelerometers
MEMS
Silicon
Fabrication
Wafer bonding
Micromachining
Masks
Capacitance
Glass
Electrodes
Substrates

Keywords

  • Accelerometer
  • Area-changed
  • Bulk micromachined
  • Capacitive
  • MEMS

ASJC Scopus subject areas

  • General

Cite this

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title = "Low-g area-changed MEMS accelerometer using bulk silicon technique",
abstract = "A bulk micromachined accelerometer based on an area variation capacitive sensing for low-g applications was developed. The accelerometer was designed with ribbed-style fingers structure on the movable mass connected in parallel and suspended over stationary electrodes composed of differential comb fingers by means of suspension beams anchored onto the substrate. A folded, rigid truss suspension design with low spring constant and low cross-axis sensitivity was chosen. The simulation was performed using Coventorware software. A three-mask bulk micromachining wafer bonding fabrication process was utilized to realize the accelerometer. Silicon-on-glass was used to achieve high sensitivity and low mechanical noise while maintaining a simple structure. The general concept, main design considerations, fabrication procedure and performance of the resulted accelerometer was elaborated and presented. A linear relationship between the differential capacitance and acceleration was obtained. The accelerometer sensitivity was calculated to be 0.47 pF/g with an acceleration range of ±5 g.",
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AB - A bulk micromachined accelerometer based on an area variation capacitive sensing for low-g applications was developed. The accelerometer was designed with ribbed-style fingers structure on the movable mass connected in parallel and suspended over stationary electrodes composed of differential comb fingers by means of suspension beams anchored onto the substrate. A folded, rigid truss suspension design with low spring constant and low cross-axis sensitivity was chosen. The simulation was performed using Coventorware software. A three-mask bulk micromachining wafer bonding fabrication process was utilized to realize the accelerometer. Silicon-on-glass was used to achieve high sensitivity and low mechanical noise while maintaining a simple structure. The general concept, main design considerations, fabrication procedure and performance of the resulted accelerometer was elaborated and presented. A linear relationship between the differential capacitance and acceleration was obtained. The accelerometer sensitivity was calculated to be 0.47 pF/g with an acceleration range of ±5 g.

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