Low cost fabrication of passive microfluidic devices

Alireza Bahadorimehr, Jumril Yunas, Ille Christine Gebeshuber, Chang Fu Dee, Burhanuddin Yeop Majlis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

This paper presents a low cost method for fabrication of microchannels on glass substrates for microfluidic devices applications. The channels with the depth up to 150μm can be achieved by implementing a typical photoresist and wet etching process without any complicated deposition methods such as CVD, evaporation or other sophisticated techniques. In particular, AZ5214 photoresist is for the first time introduced for glass etching mask which can strongly resist against etchant attacks up to 2 hours, showing high accuracy for fabrication of microfluidic microchannels. The width of the channels is determined by the width of the lines in photo-mask design and the etch rate of the substrate because of glass isotropic etching characteristics. In practical the channel width range about 30μm to 350μm is attainable. Commercially available inexpensive microscopic slides have been used as substrate for etching channels using special etchant solutions. The etch rate of the glass strongly depends on the concentration of the etchant Achieving smooth and clear surface after wet etching process is an important factor for easily flowing fluid through channels and monitoring purposes. A mixture of different solutions with special ratios has been applied to achieve smooth and clear surface of the etching regions. Two different bonding techniques, optical UV curable glue, and glass-PDMS-glass methods for adhering the etched glass substrate and non-etched glass cover is applied. A novel method for packaging, tubing and fittings for microfluidic devices using PMMA has been presented without the need for any drilling process.

Original languageEnglish
Title of host publication2010 10th IEEE Conference on Nanotechnology, NANO 2010
Pages1007-1011
Number of pages5
DOIs
Publication statusPublished - 2010
Event2010 10th IEEE Conference on Nanotechnology, NANO 2010 - Ilsan, Gyeonggi-Do
Duration: 17 Aug 201020 Aug 2010

Other

Other2010 10th IEEE Conference on Nanotechnology, NANO 2010
CityIlsan, Gyeonggi-Do
Period17/8/1020/8/10

Fingerprint

microfluidic devices
fabrication
glass
etching
etchants
microchannels
photoresists
masks
glues
drilling
chutes
packaging
attack
evaporation
vapor deposition
fluids

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Bahadorimehr, A., Yunas, J., Gebeshuber, I. C., Dee, C. F., & Yeop Majlis, B. (2010). Low cost fabrication of passive microfluidic devices. In 2010 10th IEEE Conference on Nanotechnology, NANO 2010 (pp. 1007-1011). [5697855] https://doi.org/10.1109/NANO.2010.5697855

Low cost fabrication of passive microfluidic devices. / Bahadorimehr, Alireza; Yunas, Jumril; Gebeshuber, Ille Christine; Dee, Chang Fu; Yeop Majlis, Burhanuddin.

2010 10th IEEE Conference on Nanotechnology, NANO 2010. 2010. p. 1007-1011 5697855.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Bahadorimehr, A, Yunas, J, Gebeshuber, IC, Dee, CF & Yeop Majlis, B 2010, Low cost fabrication of passive microfluidic devices. in 2010 10th IEEE Conference on Nanotechnology, NANO 2010., 5697855, pp. 1007-1011, 2010 10th IEEE Conference on Nanotechnology, NANO 2010, Ilsan, Gyeonggi-Do, 17/8/10. https://doi.org/10.1109/NANO.2010.5697855
Bahadorimehr A, Yunas J, Gebeshuber IC, Dee CF, Yeop Majlis B. Low cost fabrication of passive microfluidic devices. In 2010 10th IEEE Conference on Nanotechnology, NANO 2010. 2010. p. 1007-1011. 5697855 https://doi.org/10.1109/NANO.2010.5697855
Bahadorimehr, Alireza ; Yunas, Jumril ; Gebeshuber, Ille Christine ; Dee, Chang Fu ; Yeop Majlis, Burhanuddin. / Low cost fabrication of passive microfluidic devices. 2010 10th IEEE Conference on Nanotechnology, NANO 2010. 2010. pp. 1007-1011
@inproceedings{da7c9a2be96441bbb5e3ec4a62e3762b,
title = "Low cost fabrication of passive microfluidic devices",
abstract = "This paper presents a low cost method for fabrication of microchannels on glass substrates for microfluidic devices applications. The channels with the depth up to 150μm can be achieved by implementing a typical photoresist and wet etching process without any complicated deposition methods such as CVD, evaporation or other sophisticated techniques. In particular, AZ5214 photoresist is for the first time introduced for glass etching mask which can strongly resist against etchant attacks up to 2 hours, showing high accuracy for fabrication of microfluidic microchannels. The width of the channels is determined by the width of the lines in photo-mask design and the etch rate of the substrate because of glass isotropic etching characteristics. In practical the channel width range about 30μm to 350μm is attainable. Commercially available inexpensive microscopic slides have been used as substrate for etching channels using special etchant solutions. The etch rate of the glass strongly depends on the concentration of the etchant Achieving smooth and clear surface after wet etching process is an important factor for easily flowing fluid through channels and monitoring purposes. A mixture of different solutions with special ratios has been applied to achieve smooth and clear surface of the etching regions. Two different bonding techniques, optical UV curable glue, and glass-PDMS-glass methods for adhering the etched glass substrate and non-etched glass cover is applied. A novel method for packaging, tubing and fittings for microfluidic devices using PMMA has been presented without the need for any drilling process.",
author = "Alireza Bahadorimehr and Jumril Yunas and Gebeshuber, {Ille Christine} and Dee, {Chang Fu} and {Yeop Majlis}, Burhanuddin",
year = "2010",
doi = "10.1109/NANO.2010.5697855",
language = "English",
isbn = "9781424470334",
pages = "1007--1011",
booktitle = "2010 10th IEEE Conference on Nanotechnology, NANO 2010",

}

TY - GEN

T1 - Low cost fabrication of passive microfluidic devices

AU - Bahadorimehr, Alireza

AU - Yunas, Jumril

AU - Gebeshuber, Ille Christine

AU - Dee, Chang Fu

AU - Yeop Majlis, Burhanuddin

PY - 2010

Y1 - 2010

N2 - This paper presents a low cost method for fabrication of microchannels on glass substrates for microfluidic devices applications. The channels with the depth up to 150μm can be achieved by implementing a typical photoresist and wet etching process without any complicated deposition methods such as CVD, evaporation or other sophisticated techniques. In particular, AZ5214 photoresist is for the first time introduced for glass etching mask which can strongly resist against etchant attacks up to 2 hours, showing high accuracy for fabrication of microfluidic microchannels. The width of the channels is determined by the width of the lines in photo-mask design and the etch rate of the substrate because of glass isotropic etching characteristics. In practical the channel width range about 30μm to 350μm is attainable. Commercially available inexpensive microscopic slides have been used as substrate for etching channels using special etchant solutions. The etch rate of the glass strongly depends on the concentration of the etchant Achieving smooth and clear surface after wet etching process is an important factor for easily flowing fluid through channels and monitoring purposes. A mixture of different solutions with special ratios has been applied to achieve smooth and clear surface of the etching regions. Two different bonding techniques, optical UV curable glue, and glass-PDMS-glass methods for adhering the etched glass substrate and non-etched glass cover is applied. A novel method for packaging, tubing and fittings for microfluidic devices using PMMA has been presented without the need for any drilling process.

AB - This paper presents a low cost method for fabrication of microchannels on glass substrates for microfluidic devices applications. The channels with the depth up to 150μm can be achieved by implementing a typical photoresist and wet etching process without any complicated deposition methods such as CVD, evaporation or other sophisticated techniques. In particular, AZ5214 photoresist is for the first time introduced for glass etching mask which can strongly resist against etchant attacks up to 2 hours, showing high accuracy for fabrication of microfluidic microchannels. The width of the channels is determined by the width of the lines in photo-mask design and the etch rate of the substrate because of glass isotropic etching characteristics. In practical the channel width range about 30μm to 350μm is attainable. Commercially available inexpensive microscopic slides have been used as substrate for etching channels using special etchant solutions. The etch rate of the glass strongly depends on the concentration of the etchant Achieving smooth and clear surface after wet etching process is an important factor for easily flowing fluid through channels and monitoring purposes. A mixture of different solutions with special ratios has been applied to achieve smooth and clear surface of the etching regions. Two different bonding techniques, optical UV curable glue, and glass-PDMS-glass methods for adhering the etched glass substrate and non-etched glass cover is applied. A novel method for packaging, tubing and fittings for microfluidic devices using PMMA has been presented without the need for any drilling process.

UR - http://www.scopus.com/inward/record.url?scp=79951843570&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79951843570&partnerID=8YFLogxK

U2 - 10.1109/NANO.2010.5697855

DO - 10.1109/NANO.2010.5697855

M3 - Conference contribution

SN - 9781424470334

SP - 1007

EP - 1011

BT - 2010 10th IEEE Conference on Nanotechnology, NANO 2010

ER -