Investigation of XeF2 dry etching for contact isolation of screen printed IBC solar cell

M. Khairunaz, Suhaila Sepeai, A. W. Azhari, Kamaruzzaman Sopian, Saleem H. Zaidi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrated the use of Xenon Difluoride (XeF2) plasma less vapor etching for isolation of n and p regions in screen-printed interdigitated back contact (IBC) solar cell. The fabrication process is free from lithography process and carried out using standard conventional silicon solar cell equipment. A p-type CZ wafer was used as the starting material and POCl 3 furnace was used to form the emitter. Silver and Aluminum pastes were screen printed to form emitter and base contacts respectively. An automated XeF2 vapor etching system was used for blanket etching of doped region between emitter and base metal contacts. Solar cell LIV response was measured as a function of XeF2 etching. Open-circuit increased as a function of XeF2 etching indicating removal of doped silicon; however, solar cell response was poor presumably due to large un-passivated, junction-free regions between positive and negative contacts. In order to improve performance, an extra alignment step is needed to etch small regions only.

Original languageEnglish
Title of host publicationConference Record of the IEEE Photovoltaic Specialists Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages2230-2233
Number of pages4
ISBN (Print)9781479932993
DOIs
Publication statusPublished - 2013
Event39th IEEE Photovoltaic Specialists Conference, PVSC 2013 - Tampa, FL
Duration: 16 Jun 201321 Jun 2013

Other

Other39th IEEE Photovoltaic Specialists Conference, PVSC 2013
CityTampa, FL
Period16/6/1321/6/13

Fingerprint

Dry etching
Etching
Solar cells
Vapors
Silicon solar cells
Xenon
Contacts (fluid mechanics)
Lithography
Silver
Furnaces
Aluminum
Plasmas
Fabrication
Silicon
Networks (circuits)
Metals

Keywords

  • IBC solar cell
  • Screen-printed
  • XeF2 vapor etching

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering

Cite this

Khairunaz, M., Sepeai, S., Azhari, A. W., Sopian, K., & Zaidi, S. H. (2013). Investigation of XeF2 dry etching for contact isolation of screen printed IBC solar cell. In Conference Record of the IEEE Photovoltaic Specialists Conference (pp. 2230-2233). [6744920] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PVSC.2013.6744920

Investigation of XeF2 dry etching for contact isolation of screen printed IBC solar cell. / Khairunaz, M.; Sepeai, Suhaila; Azhari, A. W.; Sopian, Kamaruzzaman; Zaidi, Saleem H.

Conference Record of the IEEE Photovoltaic Specialists Conference. Institute of Electrical and Electronics Engineers Inc., 2013. p. 2230-2233 6744920.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Khairunaz, M, Sepeai, S, Azhari, AW, Sopian, K & Zaidi, SH 2013, Investigation of XeF2 dry etching for contact isolation of screen printed IBC solar cell. in Conference Record of the IEEE Photovoltaic Specialists Conference., 6744920, Institute of Electrical and Electronics Engineers Inc., pp. 2230-2233, 39th IEEE Photovoltaic Specialists Conference, PVSC 2013, Tampa, FL, 16/6/13. https://doi.org/10.1109/PVSC.2013.6744920
Khairunaz M, Sepeai S, Azhari AW, Sopian K, Zaidi SH. Investigation of XeF2 dry etching for contact isolation of screen printed IBC solar cell. In Conference Record of the IEEE Photovoltaic Specialists Conference. Institute of Electrical and Electronics Engineers Inc. 2013. p. 2230-2233. 6744920 https://doi.org/10.1109/PVSC.2013.6744920
Khairunaz, M. ; Sepeai, Suhaila ; Azhari, A. W. ; Sopian, Kamaruzzaman ; Zaidi, Saleem H. / Investigation of XeF2 dry etching for contact isolation of screen printed IBC solar cell. Conference Record of the IEEE Photovoltaic Specialists Conference. Institute of Electrical and Electronics Engineers Inc., 2013. pp. 2230-2233
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