Interferometric lithography for nanoscale fabrication

Saleem H. Zaidi, S. R J Brueck

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Citations (Scopus)

Abstract

Interferometric lithography (IL) techniques provide a demonstrated, low-cost, large area nanoscale patterning capability with feature resolution to approx. 50 nm. Combining IL with anisotropic etching (both by reactive-ion etching and by KOH wet etching) and with 3-D oxidation techniques provides a suite of techniques that accesses a broad range of Si nanostructures (as small as 10 nm) over large areas and with good uniformity. Optical characterization includes measurements of reflectivity for a wide range of 1D grating profiles, and Raman scattering characterization of Si nanostructures. Three regimes are found for the Raman scattering: bulk (to linewidths of approx. 200 nm), resonant enhanced (approx. 50 nm linewidths) and asymmetry and splitting (linewidths < 20 nm).

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages2-8
Number of pages7
Volume3618
Publication statusPublished - 1999
Externally publishedYes
EventProceedings of the 1999 Laser Applications in Microelectronic and Optoelectronic Manufacturing IV (LAMOM-IV) - San Jose, CA, USA
Duration: 25 Jan 199927 Jan 1999

Other

OtherProceedings of the 1999 Laser Applications in Microelectronic and Optoelectronic Manufacturing IV (LAMOM-IV)
CitySan Jose, CA, USA
Period25/1/9927/1/99

Fingerprint

Linewidth
Lithography
lithography
etching
Fabrication
fabrication
Raman scattering
Nanostructures
Raman spectra
Anisotropic etching
Wet etching
Reactive ion etching
asymmetry
gratings
reflectance
Oxidation
oxidation
profiles
Costs
ions

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Zaidi, S. H., & Brueck, S. R. J. (1999). Interferometric lithography for nanoscale fabrication. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3618, pp. 2-8). Society of Photo-Optical Instrumentation Engineers.

Interferometric lithography for nanoscale fabrication. / Zaidi, Saleem H.; Brueck, S. R J.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3618 Society of Photo-Optical Instrumentation Engineers, 1999. p. 2-8.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zaidi, SH & Brueck, SRJ 1999, Interferometric lithography for nanoscale fabrication. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 3618, Society of Photo-Optical Instrumentation Engineers, pp. 2-8, Proceedings of the 1999 Laser Applications in Microelectronic and Optoelectronic Manufacturing IV (LAMOM-IV), San Jose, CA, USA, 25/1/99.
Zaidi SH, Brueck SRJ. Interferometric lithography for nanoscale fabrication. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3618. Society of Photo-Optical Instrumentation Engineers. 1999. p. 2-8
Zaidi, Saleem H. ; Brueck, S. R J. / Interferometric lithography for nanoscale fabrication. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3618 Society of Photo-Optical Instrumentation Engineers, 1999. pp. 2-8
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