Influence of annealing temperature on the properties of ZnO thin films grown by sputtering

Jamilah Husna, M. Mannir Aliyu, M. Aminul Islam, P. Chelvanathan, N. Radhwa Hamzah, M. Sharafat Hossain, M. R. Karim, Nowshad Amin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

27 Citations (Scopus)

Abstract

Zinc oxide (ZnO) thin films were deposited by RF magnetron sputtering onto ITO coated soda-lime glass substrates. The effects of annealing in temperature range of 250 to 450°C on the structural and optical properties of the ZnO films have been studied. The crystalline structure, surface topology, morphology, optical properties of the films were determined using X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and UV-Visible Spectrometry, respectively. X-ray diffraction measurement showed that the annealed ZnO films were polycrystalline in nature with (002), (101) and (001) oriented crystallites of hexagonal wurtzite structure. Crystalline property and grain size of the films were found to increase after annealing. The optical band gap of ZnO films initially blue shifted (3.1-3.23 eV) when annealed at 400°C and further red shifted in the range of 3.23 to 3.1 eV being annealed at 250 to 450°C range. From the UV spectroscopy, the films showed transmittance over 85% in the optical bandgap spectrum. All these results indicate that post deposition annealing improves the film quality with reduced roughness and better crystalline properties that can be utilised as buffer layer in the CIGS or CdTe thin film solar cells.

Original languageEnglish
Title of host publicationEnergy Procedia
PublisherElsevier BV
Pages55-61
Number of pages7
Volume25
DOIs
Publication statusPublished - 2012
EventPV Asia Pacific Conference, PVAP 2011 - Singapore, Singapore
Duration: 2 Nov 20114 Nov 2011

Other

OtherPV Asia Pacific Conference, PVAP 2011
CountrySingapore
CitySingapore
Period2/11/114/11/11

Fingerprint

Zinc oxide
Oxide films
Sputtering
Annealing
Thin films
Optical band gaps
Crystalline materials
Optical properties
X ray diffraction
Temperature
Buffer layers
Ultraviolet spectroscopy
Crystallites
Lime
Magnetron sputtering
Spectrometry
Structural properties
Atomic force microscopy
Surface roughness
Topology

Keywords

  • Annealing
  • Optical properties
  • RF sputtering
  • Thin films
  • Zinc oxide

ASJC Scopus subject areas

  • Energy(all)

Cite this

Husna, J., Mannir Aliyu, M., Aminul Islam, M., Chelvanathan, P., Radhwa Hamzah, N., Sharafat Hossain, M., ... Amin, N. (2012). Influence of annealing temperature on the properties of ZnO thin films grown by sputtering. In Energy Procedia (Vol. 25, pp. 55-61). Elsevier BV. https://doi.org/10.1016/j.egypro.2012.07.008

Influence of annealing temperature on the properties of ZnO thin films grown by sputtering. / Husna, Jamilah; Mannir Aliyu, M.; Aminul Islam, M.; Chelvanathan, P.; Radhwa Hamzah, N.; Sharafat Hossain, M.; Karim, M. R.; Amin, Nowshad.

Energy Procedia. Vol. 25 Elsevier BV, 2012. p. 55-61.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Husna, J, Mannir Aliyu, M, Aminul Islam, M, Chelvanathan, P, Radhwa Hamzah, N, Sharafat Hossain, M, Karim, MR & Amin, N 2012, Influence of annealing temperature on the properties of ZnO thin films grown by sputtering. in Energy Procedia. vol. 25, Elsevier BV, pp. 55-61, PV Asia Pacific Conference, PVAP 2011, Singapore, Singapore, 2/11/11. https://doi.org/10.1016/j.egypro.2012.07.008
Husna J, Mannir Aliyu M, Aminul Islam M, Chelvanathan P, Radhwa Hamzah N, Sharafat Hossain M et al. Influence of annealing temperature on the properties of ZnO thin films grown by sputtering. In Energy Procedia. Vol. 25. Elsevier BV. 2012. p. 55-61 https://doi.org/10.1016/j.egypro.2012.07.008
Husna, Jamilah ; Mannir Aliyu, M. ; Aminul Islam, M. ; Chelvanathan, P. ; Radhwa Hamzah, N. ; Sharafat Hossain, M. ; Karim, M. R. ; Amin, Nowshad. / Influence of annealing temperature on the properties of ZnO thin films grown by sputtering. Energy Procedia. Vol. 25 Elsevier BV, 2012. pp. 55-61
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abstract = "Zinc oxide (ZnO) thin films were deposited by RF magnetron sputtering onto ITO coated soda-lime glass substrates. The effects of annealing in temperature range of 250 to 450°C on the structural and optical properties of the ZnO films have been studied. The crystalline structure, surface topology, morphology, optical properties of the films were determined using X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and UV-Visible Spectrometry, respectively. X-ray diffraction measurement showed that the annealed ZnO films were polycrystalline in nature with (002), (101) and (001) oriented crystallites of hexagonal wurtzite structure. Crystalline property and grain size of the films were found to increase after annealing. The optical band gap of ZnO films initially blue shifted (3.1-3.23 eV) when annealed at 400°C and further red shifted in the range of 3.23 to 3.1 eV being annealed at 250 to 450°C range. From the UV spectroscopy, the films showed transmittance over 85{\%} in the optical bandgap spectrum. All these results indicate that post deposition annealing improves the film quality with reduced roughness and better crystalline properties that can be utilised as buffer layer in the CIGS or CdTe thin film solar cells.",
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