Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography

Arash Dehzangi, Farhad Larki, Sabar D. Hutagalung, Mahmood Goodarz Naseri, Burhanuddin Yeop Majlis, Manizheh Navasery, Norihan Abdul Hamid, Mimiwaty Mohd Noor

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

In this letter, we investigate the fabrication of Silicon nanostructure patterned on lightly doped (1015 cm-3) p-type silicon-on-insulator by atomic force microscope nanolithography technique. The local anodic oxidation followed by two wet etching steps, potassium hydroxide etching for silicon removal and hydrofluoric etching for oxide removal, are implemented to reach the structures. The impact of contributing parameters in oxidation such as tip materials, applying voltage on the tip, relative humidity and exposure time are studied. The effect of the etchant concentration (10% to 30% wt) of potassium hydroxide and its mixture with isopropyl alcohol (10%vol. IPA) at different temperatures on silicon surface are expressed. For different KOH concentrations, the effect of etching with the IPA admixture and the effect of the immersing time in the etching process on the structure are investigated. The etching processes are accurately optimized by 30%wt. KOH +10%vol. IPA in appropriate time, temperature, and humidity.

Original languageEnglish
Article numbere65409
JournalPLoS One
Volume8
Issue number6
DOIs
Publication statusPublished - 11 Jun 2013

Fingerprint

Nanolithography
nanomaterials
atomic force microscopy
Nanostructures
Atomic Force Microscopy
Silicon
silicon
Etching
Atomic force microscopy
potassium hydroxide
Fabrication
Humidity
oxidation
Atmospheric humidity
Temperature
2-Propanol
isopropyl alcohol
microscopes
Oxides
Wet etching

ASJC Scopus subject areas

  • Agricultural and Biological Sciences(all)
  • Biochemistry, Genetics and Molecular Biology(all)
  • Medicine(all)

Cite this

Dehzangi, A., Larki, F., Hutagalung, S. D., Goodarz Naseri, M., Yeop Majlis, B., Navasery, M., ... Noor, M. M. (2013). Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography. PLoS One, 8(6), [e65409]. https://doi.org/10.1371/journal.pone.0065409

Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography. / Dehzangi, Arash; Larki, Farhad; Hutagalung, Sabar D.; Goodarz Naseri, Mahmood; Yeop Majlis, Burhanuddin; Navasery, Manizheh; Hamid, Norihan Abdul; Noor, Mimiwaty Mohd.

In: PLoS One, Vol. 8, No. 6, e65409, 11.06.2013.

Research output: Contribution to journalArticle

Dehzangi, A, Larki, F, Hutagalung, SD, Goodarz Naseri, M, Yeop Majlis, B, Navasery, M, Hamid, NA & Noor, MM 2013, 'Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography', PLoS One, vol. 8, no. 6, e65409. https://doi.org/10.1371/journal.pone.0065409
Dehzangi, Arash ; Larki, Farhad ; Hutagalung, Sabar D. ; Goodarz Naseri, Mahmood ; Yeop Majlis, Burhanuddin ; Navasery, Manizheh ; Hamid, Norihan Abdul ; Noor, Mimiwaty Mohd. / Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography. In: PLoS One. 2013 ; Vol. 8, No. 6.
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