Image reversal at nm-scales

Saleem H. Zaidi, Xiaolan Chen, Steven R J Brueck

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Interferometric lithography techniques provide low-cost, large area nanoscale resolution. It is difficult to control positive resist process with narrow spaces (large line: space ratios) because of the large slope of the swing curve just as the resist clears. The sidewalls are inherently sloped with significant standing wave related distortions. Also, at nm-scales, resist pattern collapse becomes a serious limiting issue. We report on investigations of image reversal using positive photoresist AZ5206E. This photoresist is designed for reversal with a simple heating step followed by a blanket UV exposure. 1D photoresist gratings were investigated with CDs varying from approximately 100 - 250 nm. The image reversal process significantly reduced standing wave effects, eliminated the collapse issue, and provided under-cut profiles suitable for lift-off. At periods < 300 nm, high aspect ratios with this photoresist could not be achieved probably due to a lack of resolution. Image reversal was also demonstrated in multiple exposure processes leading to sharp, square corners. Finally, the developed photoresist profiles with the image reversal process were found to be in good agreement with the Prolith™ modeling.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Pages1272-1279
Number of pages8
Volume3333
DOIs
Publication statusPublished - 1998
Externally publishedYes
EventAdvances in Resist Technology and Processing XV - Santa Clara, CA, United States
Duration: 23 Feb 199823 Feb 1998

Other

OtherAdvances in Resist Technology and Processing XV
CountryUnited States
CitySanta Clara, CA
Period23/2/9823/2/98

Fingerprint

Photoresist
Photoresists
Reversal
photoresists
Resist
Standing Wave
standing waves
Wave effects
blankets
profiles
high aspect ratio
Lithography
Aspect Ratio
Gratings
Heating
Aspect ratio
Slope
lithography
Limiting
gratings

Keywords

  • Image reversal
  • Interferometric techniques
  • Lithography
  • Nanoscale structures

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Zaidi, S. H., Chen, X., & Brueck, S. R. J. (1998). Image reversal at nm-scales. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3333, pp. 1272-1279) https://doi.org/10.1117/12.312437

Image reversal at nm-scales. / Zaidi, Saleem H.; Chen, Xiaolan; Brueck, Steven R J.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3333 1998. p. 1272-1279.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zaidi, SH, Chen, X & Brueck, SRJ 1998, Image reversal at nm-scales. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 3333, pp. 1272-1279, Advances in Resist Technology and Processing XV, Santa Clara, CA, United States, 23/2/98. https://doi.org/10.1117/12.312437
Zaidi SH, Chen X, Brueck SRJ. Image reversal at nm-scales. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3333. 1998. p. 1272-1279 https://doi.org/10.1117/12.312437
Zaidi, Saleem H. ; Chen, Xiaolan ; Brueck, Steven R J. / Image reversal at nm-scales. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3333 1998. pp. 1272-1279
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