High aspect-ratio holographic photoresist gratings

Saleem H. Zaidi, Steven R J Brueck

Research output: Contribution to journalArticle

47 Citations (Scopus)

Abstract

Holographic gratings with periods as small as 700 nm, rectangular profiles with linewidths of 120 nm, and depths of 1.2 m (aspect ratio of 10) have been formed using positive photoresist on Si substrates and visible laser exposure (488 nm). Similar aspect ratios have been achieved at a 400-nm period using 334-nm exposing radiation. A simple exposure and development model, which accounts for the large aspect ratios and predicts the grating fabrication limits, is presented.

Original languageEnglish
Pages (from-to)2999-3002
Number of pages4
JournalApplied Optics
Volume27
Issue number14
DOIs
Publication statusPublished - 1988
Externally publishedYes

Fingerprint

Diffraction gratings
Photoresists
high aspect ratio
photoresists
aspect ratio
Aspect ratio
gratings
Holographic gratings
Linewidth
Radiation
Fabrication
fabrication
Lasers
Substrates
radiation
profiles
lasers

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

High aspect-ratio holographic photoresist gratings. / Zaidi, Saleem H.; Brueck, Steven R J.

In: Applied Optics, Vol. 27, No. 14, 1988, p. 2999-3002.

Research output: Contribution to journalArticle

Zaidi, Saleem H. ; Brueck, Steven R J. / High aspect-ratio holographic photoresist gratings. In: Applied Optics. 1988 ; Vol. 27, No. 14. pp. 2999-3002.
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