Fabrication of thin layer membrane using CMOS process for very low pressure sensor applications

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

A very low pressure sensor has been proposed to be used in the eye for glaucoma treatment with pressure ranging from 10 mmHg to 75 mmHg. This paper presents process development of thin layer membrane for very low pressure sensor application. The structure of the membrane consists of parallel plate which both top and bottom electrodes were fixed at both sides. Utilizing CMOS compatible process, fabrication of the thin layer membrane involved in three stages; i) hole opening etch, ii) sacrificial intermediate oxide release etch and iii) closing of etch holes. Our work focuses on the characterization of holes opening etch size for the intermediate oxide release. Another study was carried out to understand the behavior of sealing off the hole openings etch. This study involved different deposition technique such as LPCVD, PECVD and combination both of them. The findings from these experiments are presented in this paper.

Original languageEnglish
Title of host publicationIEEE International Conference on Semiconductor Electronics, Proceedings, ICSE
Pages363-369
Number of pages7
DOIs
Publication statusPublished - 2008
Event2008 IEEE International Conference on Semiconductor Electronics, ICSE 2008 - Johor Bahru, Johor
Duration: 25 Nov 200827 Nov 2008

Other

Other2008 IEEE International Conference on Semiconductor Electronics, ICSE 2008
CityJohor Bahru, Johor
Period25/11/0827/11/08

Fingerprint

Pressure sensors
Membranes
Fabrication
Oxides
Plasma enhanced chemical vapor deposition
Electrodes
Experiments

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

Cite this

Fabrication of thin layer membrane using CMOS process for very low pressure sensor applications. / Buyong, Muhamad Ramdzan; Abd Aziz, Norazreen; Yeop Majlis, Burhanuddin.

IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. 2008. p. 363-369 4770342.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Buyong, MR, Abd Aziz, N & Yeop Majlis, B 2008, Fabrication of thin layer membrane using CMOS process for very low pressure sensor applications. in IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE., 4770342, pp. 363-369, 2008 IEEE International Conference on Semiconductor Electronics, ICSE 2008, Johor Bahru, Johor, 25/11/08. https://doi.org/10.1109/SMELEC.2008.4770342
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