Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD)

Mohd Asri Mat Teridi, Asif Ali Tahir, S. Senthilarasu, K. G U Wijayantha, M. Y. Sulaiman, Norasikin Ahmad Ludin, Mohd. Adib Ibrahim, Kamaruzzaman Sopian

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Nanostructured nickel oxide (NiO) photoelectrodes were fabricated with controlled morphology and texture using single-step aerosol-assisted chemical vapour deposition (AACVD). The durable one-step film fabrication process resulted in highly crystalline columnar structure. Texture controlled films were also fabricated from granular to crystalline columnar morphology by controlling the deposition temperature. The thin film electrodes are highly reproducible and possess an optical bandgap of ~3.7 eV and exhibit cathodic photocurrent.

Original languageEnglish
Pages (from-to)982-986
Number of pages5
JournalPhysica Status Solidi - Rapid Research Letters
Volume8
Issue number12
DOIs
Publication statusPublished - 1 Dec 2014

Fingerprint

Nickel oxide
nickel oxides
Aerosols
Chemical vapor deposition
aerosols
textures
Textures
vapor deposition
Crystalline materials
Fabrication
fabrication
Optical band gaps
Photocurrents
photocurrents
Thin films
Electrodes
electrodes
thin films
Temperature
temperature

Keywords

  • Aerosol-assisted chemical vapour deposition
  • NiO
  • Photoelectrochemical water splitting

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Materials Science(all)

Cite this

Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD). / Mat Teridi, Mohd Asri; Tahir, Asif Ali; Senthilarasu, S.; Wijayantha, K. G U; Sulaiman, M. Y.; Ahmad Ludin, Norasikin; Ibrahim, Mohd. Adib; Sopian, Kamaruzzaman.

In: Physica Status Solidi - Rapid Research Letters, Vol. 8, No. 12, 01.12.2014, p. 982-986.

Research output: Contribution to journalArticle

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AU - Ahmad Ludin, Norasikin

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