Fabrication of glass-based microfluidic devices with photoresist as mask

A. Bahadorimehr, Burhanuddin Yeop Majlis

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

This paper presents a low cost method for etching of glass based microfluidic devices. Microchannels with the depth up to 150 μm were achieved by implementing a photoresist and wet etching process. In particular, a photoresist based mask method is introduced for glass etching which can strongly resist against etchant attacks up to 2 hours, showing high adhesion properties on glass substrate for fabrication of microfluidic microchannels. The width of the channels is determined by the width of the lines in photo-mask design and the rate of glass isotropic etching. The channel width range about 30μm to 350μm is fabricated. Commercially available inexpensive microscopic glass slides have been used as substrate. Achieving smooth and clear surface after wet etching process is an important factor for easily flowing fluid through channels and monitoring purposes. It is achieved by implementing special etchant with adding HCL in diluted BOE solution to get smooth and clear surface. The etch rate of the glass strongly depends on the concentration of the etchant. A mixture of different solutions with special ratios has been applied. Finally, typical UV curable glue is utilized for glass-glass bonding.

Original languageEnglish
Pages (from-to)45-48
Number of pages4
JournalElektronika ir Elektrotechnika
Issue number10
Publication statusPublished - Dec 2011

Fingerprint

Photoresists
Microfluidics
Masks
Fabrication
Glass
Etching
Wet etching
Microchannels
Glass bonding
Glues
Substrates
Adhesion
Fluids
Monitoring
Costs

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Fabrication of glass-based microfluidic devices with photoresist as mask. / Bahadorimehr, A.; Yeop Majlis, Burhanuddin.

In: Elektronika ir Elektrotechnika, No. 10, 12.2011, p. 45-48.

Research output: Contribution to journalArticle

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