Evaluation of Schiff bases of 2,5-dimercapto-1,3,4-thiadiazole as photostabilizer for poly(methyl methacrylate)

Emad Yousif, Emaad Bakir, Jumat Salimon, Nadia Salih

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

The photostabilization of poly(methyl methacrylate) (PMMA) films by Schiff bases of 2,5-dimercapto-1,3,4-thiadiazole compounds was investigated. The PMMA films containing concentration of complexes 0.5% by weight were produced by the casting method from chloroform solvent. The photostabilization activities of these compounds were determined by monitoring the hydroxyl index with irradiation time. The changes in viscosity average molecular weight of PMMA with irradiation time were also tracked (using benzene as a solvent). The quantum yield of the chain scission (Φ cs) of these complexes in PMMA films was evaluated and found to range between 4.19×10 -5 and 8.75×10 -5. Results obtained showed that the rate of photostabilization of PMMA in the presence of the additive followed the trend:[1] > [2] > [3] > [4] > [5]. According to the experimental results obtained, several mechanisms were suggested depending on the structure of the additive. Among them, UV absorption, peroxide decomposer, and radical scavenger for photostabilizer mechanisms were suggested.

Original languageEnglish
Pages (from-to)279-285
Number of pages7
JournalJournal of Saudi Chemical Society
Volume16
Issue number3
DOIs
Publication statusPublished - Jul 2012

Fingerprint

Schiff Bases
Polymethyl Methacrylate
Irradiation
Peroxides
Quantum yield
Chloroform
Benzene
Hydroxyl Radical
Casting
Molecular weight
2,5-dimercapto-1,3,4-thiadiazole
Viscosity
Monitoring

Keywords

  • 2,5-Dimercapto-1,3,4-thiadiazole
  • Photochemistry
  • Photostabilizer
  • PMMA
  • Schiff base
  • UV absorber
  • UV-Vis spectroscopy

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Evaluation of Schiff bases of 2,5-dimercapto-1,3,4-thiadiazole as photostabilizer for poly(methyl methacrylate). / Yousif, Emad; Bakir, Emaad; Salimon, Jumat; Salih, Nadia.

In: Journal of Saudi Chemical Society, Vol. 16, No. 3, 07.2012, p. 279-285.

Research output: Contribution to journalArticle

@article{bc0536837d664265bdfbaed7b363b4f5,
title = "Evaluation of Schiff bases of 2,5-dimercapto-1,3,4-thiadiazole as photostabilizer for poly(methyl methacrylate)",
abstract = "The photostabilization of poly(methyl methacrylate) (PMMA) films by Schiff bases of 2,5-dimercapto-1,3,4-thiadiazole compounds was investigated. The PMMA films containing concentration of complexes 0.5{\%} by weight were produced by the casting method from chloroform solvent. The photostabilization activities of these compounds were determined by monitoring the hydroxyl index with irradiation time. The changes in viscosity average molecular weight of PMMA with irradiation time were also tracked (using benzene as a solvent). The quantum yield of the chain scission (Φ cs) of these complexes in PMMA films was evaluated and found to range between 4.19×10 -5 and 8.75×10 -5. Results obtained showed that the rate of photostabilization of PMMA in the presence of the additive followed the trend:[1] > [2] > [3] > [4] > [5]. According to the experimental results obtained, several mechanisms were suggested depending on the structure of the additive. Among them, UV absorption, peroxide decomposer, and radical scavenger for photostabilizer mechanisms were suggested.",
keywords = "2,5-Dimercapto-1,3,4-thiadiazole, Photochemistry, Photostabilizer, PMMA, Schiff base, UV absorber, UV-Vis spectroscopy",
author = "Emad Yousif and Emaad Bakir and Jumat Salimon and Nadia Salih",
year = "2012",
month = "7",
doi = "10.1016/j.jscs.2011.01.009",
language = "English",
volume = "16",
pages = "279--285",
journal = "Journal of Saudi Chemical Society",
issn = "1319-6103",
publisher = "King Saud University",
number = "3",

}

TY - JOUR

T1 - Evaluation of Schiff bases of 2,5-dimercapto-1,3,4-thiadiazole as photostabilizer for poly(methyl methacrylate)

AU - Yousif, Emad

AU - Bakir, Emaad

AU - Salimon, Jumat

AU - Salih, Nadia

PY - 2012/7

Y1 - 2012/7

N2 - The photostabilization of poly(methyl methacrylate) (PMMA) films by Schiff bases of 2,5-dimercapto-1,3,4-thiadiazole compounds was investigated. The PMMA films containing concentration of complexes 0.5% by weight were produced by the casting method from chloroform solvent. The photostabilization activities of these compounds were determined by monitoring the hydroxyl index with irradiation time. The changes in viscosity average molecular weight of PMMA with irradiation time were also tracked (using benzene as a solvent). The quantum yield of the chain scission (Φ cs) of these complexes in PMMA films was evaluated and found to range between 4.19×10 -5 and 8.75×10 -5. Results obtained showed that the rate of photostabilization of PMMA in the presence of the additive followed the trend:[1] > [2] > [3] > [4] > [5]. According to the experimental results obtained, several mechanisms were suggested depending on the structure of the additive. Among them, UV absorption, peroxide decomposer, and radical scavenger for photostabilizer mechanisms were suggested.

AB - The photostabilization of poly(methyl methacrylate) (PMMA) films by Schiff bases of 2,5-dimercapto-1,3,4-thiadiazole compounds was investigated. The PMMA films containing concentration of complexes 0.5% by weight were produced by the casting method from chloroform solvent. The photostabilization activities of these compounds were determined by monitoring the hydroxyl index with irradiation time. The changes in viscosity average molecular weight of PMMA with irradiation time were also tracked (using benzene as a solvent). The quantum yield of the chain scission (Φ cs) of these complexes in PMMA films was evaluated and found to range between 4.19×10 -5 and 8.75×10 -5. Results obtained showed that the rate of photostabilization of PMMA in the presence of the additive followed the trend:[1] > [2] > [3] > [4] > [5]. According to the experimental results obtained, several mechanisms were suggested depending on the structure of the additive. Among them, UV absorption, peroxide decomposer, and radical scavenger for photostabilizer mechanisms were suggested.

KW - 2,5-Dimercapto-1,3,4-thiadiazole

KW - Photochemistry

KW - Photostabilizer

KW - PMMA

KW - Schiff base

KW - UV absorber

KW - UV-Vis spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=84862990196&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84862990196&partnerID=8YFLogxK

U2 - 10.1016/j.jscs.2011.01.009

DO - 10.1016/j.jscs.2011.01.009

M3 - Article

VL - 16

SP - 279

EP - 285

JO - Journal of Saudi Chemical Society

JF - Journal of Saudi Chemical Society

SN - 1319-6103

IS - 3

ER -