Kesan tempoh masa enapan terhadap pembentukan elektrod filem nipis kobalt sulfida

Translated title of the contribution: Effects of deposition time on of cobalt sulfide thin film electrode formation

Norshazlinah Abdul Karim, Norasikin Ahmad Ludin, Mohd Asri Mat Teridi, Suhaila Sepeai, Mohd. Adib Ibrahim, M. Kouhnavard, Kamaruzzaman Sopian, Hironori Arakawa

Research output: Contribution to journalArticle

Abstract

Cobalt sulfide counter electrodes (CE) were prepared using the electrodeposition and ionic exchange deposition method on the fluorine doped tin oxide (FTO). Time deposition effect of thin film were analyzed by using a field emission scanning X-ray diffraction (XRD), field emission electron microscope (FESEM), atomic force microscopic (AFM), and profilometry. The electrocatalytic activities of electrode were measured using cyclic voltammetry (CV) analysis. The growth of cobalt sulfide structure was confirmed by XRD. Therefore, the optimum deposition time of cobalt sulfide thin film electrode at 10 min was exhibiting the higher electrocatalytic activity with cathodic current and surface roughness of -3.36 mA.cm-2 and 34 nm, respectively.

Original languageMalay
Pages (from-to)80-86
Number of pages7
JournalMalaysian Journal of Analytical Sciences
Volume22
Issue number1
DOIs
Publication statusPublished - 1 Feb 2018

Fingerprint

Thin films
Electrodes
Field emission microscopes
X ray diffraction
Profilometry
Fluorine
Electrodeposition
Field emission
Cyclic voltammetry
Electron microscopes
Surface roughness
Scanning
cobaltous sulfide
stannic oxide

ASJC Scopus subject areas

  • Analytical Chemistry

Cite this

Kesan tempoh masa enapan terhadap pembentukan elektrod filem nipis kobalt sulfida. / Karim, Norshazlinah Abdul; Ahmad Ludin, Norasikin; Mat Teridi, Mohd Asri; Sepeai, Suhaila; Ibrahim, Mohd. Adib; Kouhnavard, M.; Sopian, Kamaruzzaman; Arakawa, Hironori.

In: Malaysian Journal of Analytical Sciences, Vol. 22, No. 1, 01.02.2018, p. 80-86.

Research output: Contribution to journalArticle

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AU - Karim, Norshazlinah Abdul

AU - Ahmad Ludin, Norasikin

AU - Mat Teridi, Mohd Asri

AU - Sepeai, Suhaila

AU - Ibrahim, Mohd. Adib

AU - Kouhnavard, M.

AU - Sopian, Kamaruzzaman

AU - Arakawa, Hironori

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AB - Cobalt sulfide counter electrodes (CE) were prepared using the electrodeposition and ionic exchange deposition method on the fluorine doped tin oxide (FTO). Time deposition effect of thin film were analyzed by using a field emission scanning X-ray diffraction (XRD), field emission electron microscope (FESEM), atomic force microscopic (AFM), and profilometry. The electrocatalytic activities of electrode were measured using cyclic voltammetry (CV) analysis. The growth of cobalt sulfide structure was confirmed by XRD. Therefore, the optimum deposition time of cobalt sulfide thin film electrode at 10 min was exhibiting the higher electrocatalytic activity with cathodic current and surface roughness of -3.36 mA.cm-2 and 34 nm, respectively.

KW - Cobalt sulfide

KW - Electrocatalytic activity

KW - Electrodeposition

KW - Ion exchange deposition

KW - Surface roughness

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