Effects of deposition time duration on thermal diffusivity of hydrogenated amorphous carbon films

Yun Young Kim, Hasan Adli Alwi, Rozidawati Awang, Sridhar Krishnaswamy

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

In the present investigation we study the effects of film-deposition time duration on thermal diffusivity (α) of hydrogenated amorphous carbon (a-C:H) thin-films grown in a radio-frequency (RF) plasma enhanced chemical vapor deposition system. A set of films was deposited at 50W RF power for 40, 60, 80, and 100 min. Film characteristics were determined from the optical transmission spectroscopy, Fourier Transform Infrared spectroscopy, and Raman spectroscopy. Thermal diffusivity of a-C:H films was evaluated using the optical pump-and-probe technique on the aluminum-coated samples. Results show a trend of increase in - as the deposition time increases due to the microstructural changes associated with longer exposure to ion bombardment effects on the growth surface of the films.

Original languageEnglish
Article number125602
JournalJapanese Journal of Applied Physics
Volume50
Issue number12
DOIs
Publication statusPublished - Dec 2011

Fingerprint

Thermal diffusivity
Carbon films
Amorphous carbon
Amorphous films
thermal diffusivity
carbon
radio frequencies
Plasma enhanced chemical vapor deposition
Light transmission
Ion bombardment
Fourier transform infrared spectroscopy
Raman spectroscopy
bombardment
infrared spectroscopy
vapor deposition
Pumps
Spectroscopy
pumps
aluminum
Aluminum

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Effects of deposition time duration on thermal diffusivity of hydrogenated amorphous carbon films. / Kim, Yun Young; Alwi, Hasan Adli; Awang, Rozidawati; Krishnaswamy, Sridhar.

In: Japanese Journal of Applied Physics, Vol. 50, No. 12, 125602, 12.2011.

Research output: Contribution to journalArticle

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