Effects of annealing conditions on the surface morphology and crystallinity of sputtered ZnO nano films

Research output: Contribution to journalArticle

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Abstract

The effects of annealing parameters on crystallinity and surface morphology of RF sputtered zinc oxide nano films were investigated. The structure and morphology of the nano films were dependent on temperature, gas flow rate and time of annealing. The results from atomic force microscopy (AFM), field emission scanning electron microscopy (FESEM) and X-ray diffraction (XRD) showed smooth and uniform growth of c-axis orientation films with an average grain sizes from 10 to 30 nm. Increments of the annealing temperature from 400 to 800°C led to bigger grain size, better crystallinity and also increase of the surface roughness. Moreover, the results showed that the crystallinity was independent of the annealing time up to 40 min after starting the annealing process. Increase in the percentage of oxygen in the O/Ar (mixture of annealing gases) from 50% to 100% results in no changes in AFM results, but XRD revealed that the (100) peak intensity was decreased, the position of (002) peak was slightly shifted towards higher angle and FWHM of (002) peak was improved.

Original languageEnglish
Pages (from-to)209-213
Number of pages5
JournalSains Malaysiana
Volume40
Issue number3
Publication statusPublished - Mar 2011

Fingerprint

crystallinity
annealing
grain size
atomic force microscopy
diffraction
zinc oxides
gas flow
field emission
surface roughness
x rays
flow velocity
scanning electron microscopy
temperature
oxygen
gases

Keywords

  • Annealing
  • Sputtering
  • ZnO nano film

ASJC Scopus subject areas

  • General

Cite this

Effects of annealing conditions on the surface morphology and crystallinity of sputtered ZnO nano films. / Karamdel, J.; Dee, Chang Fu; Yeop Majlis, Burhanuddin.

In: Sains Malaysiana, Vol. 40, No. 3, 03.2011, p. 209-213.

Research output: Contribution to journalArticle

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