Effect of radio frequency power on A-CNX film properties and its performance as humidity sensors

Rozidawati Awang, Noorain Purhanudin, Nur Sakinah Salman

Research output: Contribution to journalArticle

Abstract

A series of amorphous carbon nitride (a-CNx) thin films were deposited on silicon (111) substrates using a home-built radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) system. The a-CNx thin films were deposited from a mixture of a fixed flow-rate of ethane (C2H6, 20 sccm) and nitrogen (N2, 47 sccm) gases with varying RF power. A higher ratio of C to H (C to H ratio is 1:3) atoms in C2H6 as compared to the ratio in methane (CH4) gas (C to H ratio is 1:4) is expected to produce an interesting effect to the film properties as humidity sensor. The characterization techniques used to determine the morphology and chemical bonding of the thin films are field emission scanning electron microscopy (FESEM) and Fourier transform infrared spectroscopy (FTIR), respectively. The variation of morphology and the existence of nitrile band in these samples are correlated with the electrical properties of a-CNx thin films. Using humidity sensing system, the sensing performance of the samples was examined. It was found that the response of sensors towards the percentage of relative humidity (% RH) change is good resistive responses and good repeatability. The sensitivity of the prepared a-CNx thin films is significantly higher (up to 79%) as compared to previous studies using CH4 or acetylene as precursor gas. Based on these results, the properties and the sensitivity of the a-CNx thin films towards humidity can be tailored by using an appropriate precursor gases and deposition parameters.

Original languageEnglish
Pages (from-to)2863-2867
Number of pages5
JournalSains Malaysiana
Volume47
Issue number11
DOIs
Publication statusPublished - 1 Nov 2018

Fingerprint

humidity
radio frequencies
sensors
thin films
gases
carbon nitrides
sensitivity
nitriles
acetylene
ethane
field emission
methane
flow velocity
infrared spectroscopy
electrical properties
vapor deposition
nitrogen
scanning electron microscopy
silicon
atoms

Keywords

  • Chemical bonding
  • Electrical properties
  • Nitrile band
  • PECVD

ASJC Scopus subject areas

  • General

Cite this

Effect of radio frequency power on A-CNX film properties and its performance as humidity sensors. / Awang, Rozidawati; Purhanudin, Noorain; Salman, Nur Sakinah.

In: Sains Malaysiana, Vol. 47, No. 11, 01.11.2018, p. 2863-2867.

Research output: Contribution to journalArticle

Awang, Rozidawati ; Purhanudin, Noorain ; Salman, Nur Sakinah. / Effect of radio frequency power on A-CNX film properties and its performance as humidity sensors. In: Sains Malaysiana. 2018 ; Vol. 47, No. 11. pp. 2863-2867.
@article{b590dae884984ace92a4a49a22ff57ae,
title = "Effect of radio frequency power on A-CNX film properties and its performance as humidity sensors",
abstract = "A series of amorphous carbon nitride (a-CNx) thin films were deposited on silicon (111) substrates using a home-built radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) system. The a-CNx thin films were deposited from a mixture of a fixed flow-rate of ethane (C2H6, 20 sccm) and nitrogen (N2, 47 sccm) gases with varying RF power. A higher ratio of C to H (C to H ratio is 1:3) atoms in C2H6 as compared to the ratio in methane (CH4) gas (C to H ratio is 1:4) is expected to produce an interesting effect to the film properties as humidity sensor. The characterization techniques used to determine the morphology and chemical bonding of the thin films are field emission scanning electron microscopy (FESEM) and Fourier transform infrared spectroscopy (FTIR), respectively. The variation of morphology and the existence of nitrile band in these samples are correlated with the electrical properties of a-CNx thin films. Using humidity sensing system, the sensing performance of the samples was examined. It was found that the response of sensors towards the percentage of relative humidity ({\%} RH) change is good resistive responses and good repeatability. The sensitivity of the prepared a-CNx thin films is significantly higher (up to 79{\%}) as compared to previous studies using CH4 or acetylene as precursor gas. Based on these results, the properties and the sensitivity of the a-CNx thin films towards humidity can be tailored by using an appropriate precursor gases and deposition parameters.",
keywords = "Chemical bonding, Electrical properties, Nitrile band, PECVD",
author = "Rozidawati Awang and Noorain Purhanudin and Salman, {Nur Sakinah}",
year = "2018",
month = "11",
day = "1",
doi = "10.17576/jsm-2018-4711-29",
language = "English",
volume = "47",
pages = "2863--2867",
journal = "Sains Malaysiana",
issn = "0126-6039",
publisher = "Penerbit Universiti Kebangsaan Malaysia",
number = "11",

}

TY - JOUR

T1 - Effect of radio frequency power on A-CNX film properties and its performance as humidity sensors

AU - Awang, Rozidawati

AU - Purhanudin, Noorain

AU - Salman, Nur Sakinah

PY - 2018/11/1

Y1 - 2018/11/1

N2 - A series of amorphous carbon nitride (a-CNx) thin films were deposited on silicon (111) substrates using a home-built radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) system. The a-CNx thin films were deposited from a mixture of a fixed flow-rate of ethane (C2H6, 20 sccm) and nitrogen (N2, 47 sccm) gases with varying RF power. A higher ratio of C to H (C to H ratio is 1:3) atoms in C2H6 as compared to the ratio in methane (CH4) gas (C to H ratio is 1:4) is expected to produce an interesting effect to the film properties as humidity sensor. The characterization techniques used to determine the morphology and chemical bonding of the thin films are field emission scanning electron microscopy (FESEM) and Fourier transform infrared spectroscopy (FTIR), respectively. The variation of morphology and the existence of nitrile band in these samples are correlated with the electrical properties of a-CNx thin films. Using humidity sensing system, the sensing performance of the samples was examined. It was found that the response of sensors towards the percentage of relative humidity (% RH) change is good resistive responses and good repeatability. The sensitivity of the prepared a-CNx thin films is significantly higher (up to 79%) as compared to previous studies using CH4 or acetylene as precursor gas. Based on these results, the properties and the sensitivity of the a-CNx thin films towards humidity can be tailored by using an appropriate precursor gases and deposition parameters.

AB - A series of amorphous carbon nitride (a-CNx) thin films were deposited on silicon (111) substrates using a home-built radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) system. The a-CNx thin films were deposited from a mixture of a fixed flow-rate of ethane (C2H6, 20 sccm) and nitrogen (N2, 47 sccm) gases with varying RF power. A higher ratio of C to H (C to H ratio is 1:3) atoms in C2H6 as compared to the ratio in methane (CH4) gas (C to H ratio is 1:4) is expected to produce an interesting effect to the film properties as humidity sensor. The characterization techniques used to determine the morphology and chemical bonding of the thin films are field emission scanning electron microscopy (FESEM) and Fourier transform infrared spectroscopy (FTIR), respectively. The variation of morphology and the existence of nitrile band in these samples are correlated with the electrical properties of a-CNx thin films. Using humidity sensing system, the sensing performance of the samples was examined. It was found that the response of sensors towards the percentage of relative humidity (% RH) change is good resistive responses and good repeatability. The sensitivity of the prepared a-CNx thin films is significantly higher (up to 79%) as compared to previous studies using CH4 or acetylene as precursor gas. Based on these results, the properties and the sensitivity of the a-CNx thin films towards humidity can be tailored by using an appropriate precursor gases and deposition parameters.

KW - Chemical bonding

KW - Electrical properties

KW - Nitrile band

KW - PECVD

UR - http://www.scopus.com/inward/record.url?scp=85059820131&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85059820131&partnerID=8YFLogxK

U2 - 10.17576/jsm-2018-4711-29

DO - 10.17576/jsm-2018-4711-29

M3 - Article

VL - 47

SP - 2863

EP - 2867

JO - Sains Malaysiana

JF - Sains Malaysiana

SN - 0126-6039

IS - 11

ER -