Effect of plasma treatment (He/CH4) on glass surface for the reduction of powder flux adhesion in the spray drying process

Nadiah Ramlan, Nazirah Wahidah Mohd Zamri, Mohamad Yusof Maskat, Chin Oi Hoong, Lau Yen Theng, Saiful Irwan Zubairi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A 50Hz glow discharge He/CH4 plasma was generated and applied for the modification of glass surface to reduce powder adhesion on the wall of spray dryer. The hydrophobicity of the glass samples determined by the water droplet contact angle and adhesion weight on glass, dependent on the CH4 flow rate and plasma exposure time. There was a peak that appeared at 1470cm-1 on the surface of treated glass indicating the presence of CH3 groups from ATR-FTIR data. Surface morphology analysis using scanning electron microscopy (SEM) showed changes of roughness in the surface-Treated glass. The presence of alkyl group (CH3) that deposited on the glass surface is one of the factors that contribute to the increase in the surface roughness. The surface roughness will reflect the value of contact angle where hydrophobic surface are rougher compared to hydrophilic surface. The plasma treatment could enhance the value of the contact angle and thus reduced the adhesion on the spray dryer glass surface.

Original languageEnglish
Title of host publication2017 UKM FST Postgraduate Colloquium
Subtitle of host publicationProceedings of the University Kebangsaan Malaysia, Faculty of Science and Technology 2017 Postgraduate Colloquium
PublisherAmerican Institute of Physics Inc.
Volume1940
ISBN (Electronic)9780735416321
DOIs
Publication statusPublished - 4 Apr 2018
Event2017 UKM FST Postgraduate Colloquium - Selangor, Malaysia
Duration: 12 Jul 201713 Jul 2017

Other

Other2017 UKM FST Postgraduate Colloquium
CountryMalaysia
CitySelangor
Period12/7/1713/7/17

Fingerprint

drying
sprayers
adhesion
glass
drying apparatus
surface roughness
hydrophobicity
glow discharges
roughness
flow velocity
scanning electron microscopy
water

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Ramlan, N., Zamri, N. W. M., Maskat, M. Y., Hoong, C. O., Theng, L. Y., & Zubairi, S. I. (2018). Effect of plasma treatment (He/CH4) on glass surface for the reduction of powder flux adhesion in the spray drying process. In 2017 UKM FST Postgraduate Colloquium: Proceedings of the University Kebangsaan Malaysia, Faculty of Science and Technology 2017 Postgraduate Colloquium (Vol. 1940). [020093] American Institute of Physics Inc.. https://doi.org/10.1063/1.5028008

Effect of plasma treatment (He/CH4) on glass surface for the reduction of powder flux adhesion in the spray drying process. / Ramlan, Nadiah; Zamri, Nazirah Wahidah Mohd; Maskat, Mohamad Yusof; Hoong, Chin Oi; Theng, Lau Yen; Zubairi, Saiful Irwan.

2017 UKM FST Postgraduate Colloquium: Proceedings of the University Kebangsaan Malaysia, Faculty of Science and Technology 2017 Postgraduate Colloquium. Vol. 1940 American Institute of Physics Inc., 2018. 020093.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Ramlan, N, Zamri, NWM, Maskat, MY, Hoong, CO, Theng, LY & Zubairi, SI 2018, Effect of plasma treatment (He/CH4) on glass surface for the reduction of powder flux adhesion in the spray drying process. in 2017 UKM FST Postgraduate Colloquium: Proceedings of the University Kebangsaan Malaysia, Faculty of Science and Technology 2017 Postgraduate Colloquium. vol. 1940, 020093, American Institute of Physics Inc., 2017 UKM FST Postgraduate Colloquium, Selangor, Malaysia, 12/7/17. https://doi.org/10.1063/1.5028008
Ramlan N, Zamri NWM, Maskat MY, Hoong CO, Theng LY, Zubairi SI. Effect of plasma treatment (He/CH4) on glass surface for the reduction of powder flux adhesion in the spray drying process. In 2017 UKM FST Postgraduate Colloquium: Proceedings of the University Kebangsaan Malaysia, Faculty of Science and Technology 2017 Postgraduate Colloquium. Vol. 1940. American Institute of Physics Inc. 2018. 020093 https://doi.org/10.1063/1.5028008
Ramlan, Nadiah ; Zamri, Nazirah Wahidah Mohd ; Maskat, Mohamad Yusof ; Hoong, Chin Oi ; Theng, Lau Yen ; Zubairi, Saiful Irwan. / Effect of plasma treatment (He/CH4) on glass surface for the reduction of powder flux adhesion in the spray drying process. 2017 UKM FST Postgraduate Colloquium: Proceedings of the University Kebangsaan Malaysia, Faculty of Science and Technology 2017 Postgraduate Colloquium. Vol. 1940 American Institute of Physics Inc., 2018.
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abstract = "A 50Hz glow discharge He/CH4 plasma was generated and applied for the modification of glass surface to reduce powder adhesion on the wall of spray dryer. The hydrophobicity of the glass samples determined by the water droplet contact angle and adhesion weight on glass, dependent on the CH4 flow rate and plasma exposure time. There was a peak that appeared at 1470cm-1 on the surface of treated glass indicating the presence of CH3 groups from ATR-FTIR data. Surface morphology analysis using scanning electron microscopy (SEM) showed changes of roughness in the surface-Treated glass. The presence of alkyl group (CH3) that deposited on the glass surface is one of the factors that contribute to the increase in the surface roughness. The surface roughness will reflect the value of contact angle where hydrophobic surface are rougher compared to hydrophilic surface. The plasma treatment could enhance the value of the contact angle and thus reduced the adhesion on the spray dryer glass surface.",
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