Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate

F. B. Fauzi, M. H. Ani, S. H. Herman, Mohd Ambri Mohamed

Research output: Contribution to journalConference article

Abstract

Memristor has become one of the alternatives to replace the current memory technologies. Fabrication of titanium dioxide, TiO2 memristor has been extensively studied by using various deposition methods. However, recently more researches have been done to explore the compatibility of other transition metal oxide, TMO such as zinc oxide, ZnO to be used as the active layer of the memristor. This paper highlights the simple and easy-control electrodeposition to deposit titanium, Ti and zinc, Zn thin film at room temperature and subsequent thermal oxidation at 600 °C. Gold, Au was then sputtered as top electrode to create metal-insulator-metal, MIM sandwich of Au/TiO2-Cu2O-CuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristors. The structural, morphological and memristive properties were characterized using Field Emission Scanning Electron Microscopy, FESEM, X-Ray Diffraction, XRD and current-voltage, I-V measurement. Both Au/TiO2-Cu2O-CuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristivity were identified by the pinched hysteresis loop with resistive ratio of 1.2 and 1.08 respectively. Empirical study on diffusivity of Ti4+, Zn2+ and O2- ions in both metal oxides show that the metal vacancies were formed, thus giving rise to its memristivity. The electrodeposited Au/TiO2-Cu2O-CuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristors demonstrate comparable performances to previous studies using other methods.

Original languageEnglish
Article number012006
JournalIOP Conference Series: Materials Science and Engineering
Volume340
Issue number1
DOIs
Publication statusPublished - 9 Apr 2018
Event6th International Conference on Electronic Devices, Systems and Applications 2017, ICEDSA 2017 - Kuching, Sarawak, Malaysia
Duration: 7 Aug 20178 Aug 2017

Fingerprint

Memristors
Electrodeposition
Thin films
Metals
Substrates
Oxides
Titanium deposits
Zinc deposits
Zinc Oxide
Hysteresis loops
Zinc oxide
Gold
Field emission
Titanium dioxide
Vacancies
Transition metals
Ions
Data storage equipment
Fabrication
X ray diffraction

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

Cite this

Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate. / Fauzi, F. B.; Ani, M. H.; Herman, S. H.; Mohamed, Mohd Ambri.

In: IOP Conference Series: Materials Science and Engineering, Vol. 340, No. 1, 012006, 09.04.2018.

Research output: Contribution to journalConference article

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