Pembangunan bahan fotopeka silika terdop fosforus untuk fabrikasi pandu gelombang optik

Translated title of the contribution: Development of phosphorus doped silica photosensitive material for optical waveguide fabrication

Mohd Syuhaimi Ab Rahman, Hadi Guna, Sahbudin Shaari

Research output: Contribution to journalArticle

Abstract

This research was conducted to develop an optical waveguide made from phosphorus doped silica photosensitive material. The spin coating technique was conducted using a source in liquid form called tetraethyl orthosilicate, phosphoric acid and also PBF to produced phosphorus doped silica photosensitive waveguide and boron. In range between 1 μm and 8 μm thickness, the doped silica photosensitive waveguide, showed refractive index modulation is reaching 1 ×10 -14 between 3 and 8 μm thickness. For each testing and photosensitive treatment process was run using a 366 nm UV source, 0.369 mW/cm 2 at 50Hz pulse rate. For every samples produced from this exposure shows a deviation of their index value, which the UV exposure was held about 10 minutes. By using ArF or KrF laser inscriber with 10 mW power for example, exposure period needed was just between 20 to 30 seconds to change the refractive index of waveguide. Beside, compensation process also held to improve the performance due to the tolerance effect from the simulation process. In order to improve the efficiency of refractive index and the layer thickness of BPSG, a graphical user interface program has been successfully developed to accelerate and improve the accuracy of reading measured from manual prism coupler.

Original languageUndefined/Unknown
Pages (from-to)111-120
Number of pages10
JournalSains Malaysiana
Volume41
Issue number1
Publication statusPublished - Jan 2012

Fingerprint

optical waveguides
phosphorus
refractivity
silicon dioxide
waveguides
fabrication
pulse rate
tetraethyl orthosilicate
graphical user interface
phosphoric acid
couplers
prisms
coating
boron
deviation
modulation
liquids
lasers
simulation

Keywords

  • Mesh network
  • Migration
  • OXADM
  • Ring network

ASJC Scopus subject areas

  • General

Cite this

Pembangunan bahan fotopeka silika terdop fosforus untuk fabrikasi pandu gelombang optik. / Ab Rahman, Mohd Syuhaimi; Guna, Hadi; Shaari, Sahbudin.

In: Sains Malaysiana, Vol. 41, No. 1, 01.2012, p. 111-120.

Research output: Contribution to journalArticle

@article{faf0306f9bf143f283165529bef15cce,
title = "Pembangunan bahan fotopeka silika terdop fosforus untuk fabrikasi pandu gelombang optik",
abstract = "This research was conducted to develop an optical waveguide made from phosphorus doped silica photosensitive material. The spin coating technique was conducted using a source in liquid form called tetraethyl orthosilicate, phosphoric acid and also PBF to produced phosphorus doped silica photosensitive waveguide and boron. In range between 1 μm and 8 μm thickness, the doped silica photosensitive waveguide, showed refractive index modulation is reaching 1 ×10 -14 between 3 and 8 μm thickness. For each testing and photosensitive treatment process was run using a 366 nm UV source, 0.369 mW/cm 2 at 50Hz pulse rate. For every samples produced from this exposure shows a deviation of their index value, which the UV exposure was held about 10 minutes. By using ArF or KrF laser inscriber with 10 mW power for example, exposure period needed was just between 20 to 30 seconds to change the refractive index of waveguide. Beside, compensation process also held to improve the performance due to the tolerance effect from the simulation process. In order to improve the efficiency of refractive index and the layer thickness of BPSG, a graphical user interface program has been successfully developed to accelerate and improve the accuracy of reading measured from manual prism coupler.",
keywords = "Mesh network, Migration, OXADM, Ring network",
author = "{Ab Rahman}, {Mohd Syuhaimi} and Hadi Guna and Sahbudin Shaari",
year = "2012",
month = "1",
language = "Undefined/Unknown",
volume = "41",
pages = "111--120",
journal = "Sains Malaysiana",
issn = "0126-6039",
publisher = "Penerbit Universiti Kebangsaan Malaysia",
number = "1",

}

TY - JOUR

T1 - Pembangunan bahan fotopeka silika terdop fosforus untuk fabrikasi pandu gelombang optik

AU - Ab Rahman, Mohd Syuhaimi

AU - Guna, Hadi

AU - Shaari, Sahbudin

PY - 2012/1

Y1 - 2012/1

N2 - This research was conducted to develop an optical waveguide made from phosphorus doped silica photosensitive material. The spin coating technique was conducted using a source in liquid form called tetraethyl orthosilicate, phosphoric acid and also PBF to produced phosphorus doped silica photosensitive waveguide and boron. In range between 1 μm and 8 μm thickness, the doped silica photosensitive waveguide, showed refractive index modulation is reaching 1 ×10 -14 between 3 and 8 μm thickness. For each testing and photosensitive treatment process was run using a 366 nm UV source, 0.369 mW/cm 2 at 50Hz pulse rate. For every samples produced from this exposure shows a deviation of their index value, which the UV exposure was held about 10 minutes. By using ArF or KrF laser inscriber with 10 mW power for example, exposure period needed was just between 20 to 30 seconds to change the refractive index of waveguide. Beside, compensation process also held to improve the performance due to the tolerance effect from the simulation process. In order to improve the efficiency of refractive index and the layer thickness of BPSG, a graphical user interface program has been successfully developed to accelerate and improve the accuracy of reading measured from manual prism coupler.

AB - This research was conducted to develop an optical waveguide made from phosphorus doped silica photosensitive material. The spin coating technique was conducted using a source in liquid form called tetraethyl orthosilicate, phosphoric acid and also PBF to produced phosphorus doped silica photosensitive waveguide and boron. In range between 1 μm and 8 μm thickness, the doped silica photosensitive waveguide, showed refractive index modulation is reaching 1 ×10 -14 between 3 and 8 μm thickness. For each testing and photosensitive treatment process was run using a 366 nm UV source, 0.369 mW/cm 2 at 50Hz pulse rate. For every samples produced from this exposure shows a deviation of their index value, which the UV exposure was held about 10 minutes. By using ArF or KrF laser inscriber with 10 mW power for example, exposure period needed was just between 20 to 30 seconds to change the refractive index of waveguide. Beside, compensation process also held to improve the performance due to the tolerance effect from the simulation process. In order to improve the efficiency of refractive index and the layer thickness of BPSG, a graphical user interface program has been successfully developed to accelerate and improve the accuracy of reading measured from manual prism coupler.

KW - Mesh network

KW - Migration

KW - OXADM

KW - Ring network

UR - http://www.scopus.com/inward/record.url?scp=84055190708&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84055190708&partnerID=8YFLogxK

M3 - Article

VL - 41

SP - 111

EP - 120

JO - Sains Malaysiana

JF - Sains Malaysiana

SN - 0126-6039

IS - 1

ER -