Deposition of micro contact based probe cell for IC testing by Dc magnetron sputtering technique

M. Idzdihar Idris, Nowshad Amin, Faiz Arith, S. A M Chachuli

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

This study presents the deposition of micro contact probe cell for IC testing deposited by dc sputtering technique on a glass substrate. Micro contact with thickness of 2800-7000 nm were deposited from Copper target at sputtering power of 125 W in argon ambient at a room temperature on a base layer of copper using mask. Then, the micro contacts were investigated by using profilometer. All the obtained results show the potential viability of the novel test fixture and thus solve the limitation of the pogo pin based testing tools by replacing them with the novel IC test fixture as demonstrated in this study.

Original languageEnglish
Pages (from-to)2701-2704
Number of pages4
JournalResearch Journal of Applied Sciences, Engineering and Technology
Volume7
Issue number13
Publication statusPublished - 2014

Fingerprint

Magnetron sputtering
Sputtering
Copper
Testing
Argon
Masks
Glass
Substrates
Temperature

Keywords

  • DC sputtering deposition
  • Micro contact
  • Pogo pin
  • Test socket

ASJC Scopus subject areas

  • Engineering(all)
  • Computer Science(all)

Cite this

Deposition of micro contact based probe cell for IC testing by Dc magnetron sputtering technique. / Idris, M. Idzdihar; Amin, Nowshad; Arith, Faiz; Chachuli, S. A M.

In: Research Journal of Applied Sciences, Engineering and Technology, Vol. 7, No. 13, 2014, p. 2701-2704.

Research output: Contribution to journalArticle

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