Controllable formation of MoS2 via preferred crystallographic orientation modulation of DC-sputtered Mo thin film

P. Chelvanathan, S. A. Shahahmadi, M. T. Ferdaous, M. M.I. Sapeli, Kamaruzzaman Sopian, Nowshad Amin

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

In this letter, we report the effects of preferred crystallographic orientation of Mo films on the formation of MoS2 layer through elemental sulphurization process. Vacuum thermal annealing of as-sputtered Mo films results in noticeable change in preferred crystallographic orientation from (1 1 0) to (2 1 1) plane. Correlation between structural and Raman spectroscopy study indicates that Mo film with predominantly (2 1 1) orientation results in pronounced formation of MoS2 compared to the film with the higher degree of (1 1 0) orientation. Planar packing factor, which depends on crystallographic orientation is proposed to play a crucial role in determining the degree of MoS2 formation.

Original languageEnglish
Pages (from-to)174-177
Number of pages4
JournalMaterials Letters
Volume219
DOIs
Publication statusPublished - 15 May 2018

Fingerprint

direct current
Modulation
modulation
Thin films
thin films
Raman spectroscopy
Vacuum
Annealing
vacuum
annealing
spectroscopy

Keywords

  • CZTS solar cells
  • Mo crystallographic orientation
  • MoS
  • Sputtering
  • Sulphurization
  • Thin films

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Controllable formation of MoS2 via preferred crystallographic orientation modulation of DC-sputtered Mo thin film. / Chelvanathan, P.; Shahahmadi, S. A.; Ferdaous, M. T.; Sapeli, M. M.I.; Sopian, Kamaruzzaman; Amin, Nowshad.

In: Materials Letters, Vol. 219, 15.05.2018, p. 174-177.

Research output: Contribution to journalArticle

Chelvanathan, P. ; Shahahmadi, S. A. ; Ferdaous, M. T. ; Sapeli, M. M.I. ; Sopian, Kamaruzzaman ; Amin, Nowshad. / Controllable formation of MoS2 via preferred crystallographic orientation modulation of DC-sputtered Mo thin film. In: Materials Letters. 2018 ; Vol. 219. pp. 174-177.
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