Cmos downsizing: Present, past and future

Siti Sarah BintiMdSallah, Habibah Mohamed, Md. Mamun Ibne Reaz, Md Syedul Amin

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

The evolution process of Complementary Metal Oxide Semiconductor (CMOS) is very important for the modern technology. CMOS beyond 22nm and toward 7nm faced many challenges and opportunities in design. The downsizing evolution is reviewed on scaling theory as well as limitation issues focusing on performance, power utilization, economical, technological and reliability issues. It is expected that the CMOS sizelimit of 7nm of physical gate length will be overcome in 2018 by using High-k materials. Besides, high-k dielectric materials can reduce the current leakage problem. Behind the transistor downsizing, the lithography technology is one of the key important processes. Several issues are being highlighted and discussed in term of performance, power utilization, material, economical, and technological limitations.

Original languageEnglish
Pages (from-to)4138-4146
Number of pages9
JournalJournal of Applied Sciences Research
Volume8
Issue number8
Publication statusPublished - 2012

Fingerprint

Electric power utilization
Metals
Leakage currents
Lithography
Transistors
Oxide semiconductors
High-k dielectric

Keywords

  • 7nm Gate Length
  • CMOS
  • Downsizing
  • High-k
  • VLSI

ASJC Scopus subject areas

  • General

Cite this

BintiMdSallah, S. S., Mohamed, H., Ibne Reaz, M. M., & Amin, M. S. (2012). Cmos downsizing: Present, past and future. Journal of Applied Sciences Research, 8(8), 4138-4146.

Cmos downsizing : Present, past and future. / BintiMdSallah, Siti Sarah; Mohamed, Habibah; Ibne Reaz, Md. Mamun; Amin, Md Syedul.

In: Journal of Applied Sciences Research, Vol. 8, No. 8, 2012, p. 4138-4146.

Research output: Contribution to journalArticle

BintiMdSallah, SS, Mohamed, H, Ibne Reaz, MM & Amin, MS 2012, 'Cmos downsizing: Present, past and future', Journal of Applied Sciences Research, vol. 8, no. 8, pp. 4138-4146.
BintiMdSallah SS, Mohamed H, Ibne Reaz MM, Amin MS. Cmos downsizing: Present, past and future. Journal of Applied Sciences Research. 2012;8(8):4138-4146.
BintiMdSallah, Siti Sarah ; Mohamed, Habibah ; Ibne Reaz, Md. Mamun ; Amin, Md Syedul. / Cmos downsizing : Present, past and future. In: Journal of Applied Sciences Research. 2012 ; Vol. 8, No. 8. pp. 4138-4146.
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