Chemical Vapor Deposition of Methane in the Presence of Cu/Si Nanoparticles as a Facile Method for Graphene Production

Ghazaleh Allaedini, Payam Aminayi, Siti Masrinda Tasirin, Ebrahim Mahmoudi

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

This study reports on a facile, scalable, and economical method for the synthesis of graphene sheets via catalytic decomposition of methane. The catalyst was prepared by a simple sol-gel method. In this method, copper was doped by a silicon dioxide substrate to prepare a novel catalyst to be used in the chemical vapor deposition (CVD) process. The CVD method has a remarkably high capacity as well as efficiency potentials in terms of high-yield graphene production with superior morphology. Few-layered graphene (FLG) sheets were produced successfully under atmospheric pressure. The X-ray crystallography patterns confirmed the formation of graphene sheets. The obtained graphene was characterized by Raman spectroscopy, and the results proved that high quality graphene sheets with an ID/IG ratio of 0.7 were obtained. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) micrographs were also used to investigate the shape and the morphology of the prepared FLG. The average thickness of the obtained graphene sheets was found to be equal to 8 nm using transmission electron microscopy (TEM). XRD, FTIR and XPS spectra were also obtained to confirm the formation of graphene and its nature.

Original languageEnglish
Pages (from-to)968-973
Number of pages6
JournalFullerenes Nanotubes and Carbon Nanostructures
Volume23
Issue number11
DOIs
Publication statusPublished - 2 Nov 2015

Fingerprint

Graphite
Methane
Graphene
Chemical vapor deposition
graphene
methane
vapor deposition
Nanoparticles
nanoparticles
catalysts
Catalysts
X ray crystallography
Silicon Dioxide
Sol-gel process
Atmospheric pressure
crystallography
Raman spectroscopy
Copper
Atomic force microscopy
atmospheric pressure

Keywords

  • chemical vapor deposition (CVD)
  • Cu/Si nanoparticles
  • Few-layered graphene (FLG)
  • sol gel

ASJC Scopus subject areas

  • Organic Chemistry
  • Physical and Theoretical Chemistry
  • Materials Science(all)
  • Atomic and Molecular Physics, and Optics

Cite this

Chemical Vapor Deposition of Methane in the Presence of Cu/Si Nanoparticles as a Facile Method for Graphene Production. / Allaedini, Ghazaleh; Aminayi, Payam; Tasirin, Siti Masrinda; Mahmoudi, Ebrahim.

In: Fullerenes Nanotubes and Carbon Nanostructures, Vol. 23, No. 11, 02.11.2015, p. 968-973.

Research output: Contribution to journalArticle

Allaedini, Ghazaleh ; Aminayi, Payam ; Tasirin, Siti Masrinda ; Mahmoudi, Ebrahim. / Chemical Vapor Deposition of Methane in the Presence of Cu/Si Nanoparticles as a Facile Method for Graphene Production. In: Fullerenes Nanotubes and Carbon Nanostructures. 2015 ; Vol. 23, No. 11. pp. 968-973.
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