Chemical molecular beam deposition of II-VI binary and ternary compound films in a gas flow

T. M. Razykov

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The paper presents results of an investigation of the growth process of large area (50 cm2) CdSe, CdTe, ZnTe and ZnxCd1-xTe (0 ≤ x ≤ 1) films by chemical molecular beam deposition in flowing H2 and Ar from elementary sources of Cd, Zn, Se and Te. The molecular beam intensities I have been varied in the range of 1013-1015 cm-2 s-1. The condensation temperatures were 400 to 600°C. The influence of the molecular beam intensities ratio, over a wide range, namely 10-2< III IVI<10, on the deposition rate, structure and resistivity of the films has been studied. The deposition rate and the thickness of films was varied over the range 0.2-2 Å/s and 102-104 Å, respectively.

Original languageEnglish
Pages (from-to)89-92
Number of pages4
JournalApplied Surface Science
Volume48-49
Issue numberC
DOIs
Publication statusPublished - 1991
Externally publishedYes

Fingerprint

Molecular beams
molecular beams
gas flow
Flow of gases
Deposition rates
Condensation
condensation
electrical resistivity
Temperature
temperature

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

Chemical molecular beam deposition of II-VI binary and ternary compound films in a gas flow. / Razykov, T. M.

In: Applied Surface Science, Vol. 48-49, No. C, 1991, p. 89-92.

Research output: Contribution to journalArticle

@article{78d243a9bd21465fa6b8114bed23c394,
title = "Chemical molecular beam deposition of II-VI binary and ternary compound films in a gas flow",
abstract = "The paper presents results of an investigation of the growth process of large area (50 cm2) CdSe, CdTe, ZnTe and ZnxCd1-xTe (0 ≤ x ≤ 1) films by chemical molecular beam deposition in flowing H2 and Ar from elementary sources of Cd, Zn, Se and Te. The molecular beam intensities I have been varied in the range of 1013-1015 cm-2 s-1. The condensation temperatures were 400 to 600°C. The influence of the molecular beam intensities ratio, over a wide range, namely 10-2< III IVI<10, on the deposition rate, structure and resistivity of the films has been studied. The deposition rate and the thickness of films was varied over the range 0.2-2 {\AA}/s and 102-104 {\AA}, respectively.",
author = "Razykov, {T. M.}",
year = "1991",
doi = "10.1016/0169-4332(91)90311-7",
language = "English",
volume = "48-49",
pages = "89--92",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",
number = "C",

}

TY - JOUR

T1 - Chemical molecular beam deposition of II-VI binary and ternary compound films in a gas flow

AU - Razykov, T. M.

PY - 1991

Y1 - 1991

N2 - The paper presents results of an investigation of the growth process of large area (50 cm2) CdSe, CdTe, ZnTe and ZnxCd1-xTe (0 ≤ x ≤ 1) films by chemical molecular beam deposition in flowing H2 and Ar from elementary sources of Cd, Zn, Se and Te. The molecular beam intensities I have been varied in the range of 1013-1015 cm-2 s-1. The condensation temperatures were 400 to 600°C. The influence of the molecular beam intensities ratio, over a wide range, namely 10-2< III IVI<10, on the deposition rate, structure and resistivity of the films has been studied. The deposition rate and the thickness of films was varied over the range 0.2-2 Å/s and 102-104 Å, respectively.

AB - The paper presents results of an investigation of the growth process of large area (50 cm2) CdSe, CdTe, ZnTe and ZnxCd1-xTe (0 ≤ x ≤ 1) films by chemical molecular beam deposition in flowing H2 and Ar from elementary sources of Cd, Zn, Se and Te. The molecular beam intensities I have been varied in the range of 1013-1015 cm-2 s-1. The condensation temperatures were 400 to 600°C. The influence of the molecular beam intensities ratio, over a wide range, namely 10-2< III IVI<10, on the deposition rate, structure and resistivity of the films has been studied. The deposition rate and the thickness of films was varied over the range 0.2-2 Å/s and 102-104 Å, respectively.

UR - http://www.scopus.com/inward/record.url?scp=0026156585&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0026156585&partnerID=8YFLogxK

U2 - 10.1016/0169-4332(91)90311-7

DO - 10.1016/0169-4332(91)90311-7

M3 - Article

AN - SCOPUS:0026156585

VL - 48-49

SP - 89

EP - 92

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - C

ER -