Characterization using XPS and XRD of Ti(C,N) coating properties for cutting tool applications

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1 Citation (Scopus)

Abstract

The properties of titanium carbonitride (TiCN) are a result of its composition, which can be adjusted by controlling the material's C-N ratio to a precise level. An experimental study was conducted to vary the composition and properties of TiCN. The substrate used for cathodic arc physical vapour deposition (CAPVD) was tungsten carbide (WC-6Co), which was prepared in-house by a powder metallurgy process. Pure titanium (Ti) was used as a cathode and source of Ti. Methane (CH4) and nitrogen (N2) gases were used as sources of C and N to form the Ti(C,N) coating applied in the CAPVD process. Tests showed that the composition and properties of Ti(C,N) were successfully varied by controlling the CH4-N2 ratio. The surface microhardness of coated carbide samples improved and the coefficient of friction declined as the carbon content incorporated within the Ti(C,N) coating increased.

Original languageEnglish
Pages (from-to)287-290
Number of pages4
JournalInterCeram: International Ceramic Review
Volume64
Issue number6
Publication statusPublished - 1 Oct 2015

Fingerprint

Cutting tools
Titanium
X ray photoelectron spectroscopy
Coatings
Physical vapor deposition
Carbon nitride
Chemical analysis
Methane
Powder metallurgy
Microhardness
Carbides
Tungsten carbide
Cathodes
Nitrogen
Carbon
Gases
Friction
Substrates
titanium carbonitride

Keywords

  • Cathodic arc physical vapour deposition (CAPVD)
  • Cutting tool
  • TiCN coating
  • XPS
  • XRD

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry
  • Inorganic Chemistry

Cite this

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abstract = "The properties of titanium carbonitride (TiCN) are a result of its composition, which can be adjusted by controlling the material's C-N ratio to a precise level. An experimental study was conducted to vary the composition and properties of TiCN. The substrate used for cathodic arc physical vapour deposition (CAPVD) was tungsten carbide (WC-6Co), which was prepared in-house by a powder metallurgy process. Pure titanium (Ti) was used as a cathode and source of Ti. Methane (CH4) and nitrogen (N2) gases were used as sources of C and N to form the Ti(C,N) coating applied in the CAPVD process. Tests showed that the composition and properties of Ti(C,N) were successfully varied by controlling the CH4-N2 ratio. The surface microhardness of coated carbide samples improved and the coefficient of friction declined as the carbon content incorporated within the Ti(C,N) coating increased.",
keywords = "Cathodic arc physical vapour deposition (CAPVD), Cutting tool, TiCN coating, XPS, XRD",
author = "Siow, {P. C.} and {A Ghani}, Jaharah and Talib, {R. J.} and Ghazali, {Mariyam Jameelah} and {Che Haron}, {Che Hassan}",
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AU - Siow, P. C.

AU - A Ghani, Jaharah

AU - Talib, R. J.

AU - Ghazali, Mariyam Jameelah

AU - Che Haron, Che Hassan

PY - 2015/10/1

Y1 - 2015/10/1

N2 - The properties of titanium carbonitride (TiCN) are a result of its composition, which can be adjusted by controlling the material's C-N ratio to a precise level. An experimental study was conducted to vary the composition and properties of TiCN. The substrate used for cathodic arc physical vapour deposition (CAPVD) was tungsten carbide (WC-6Co), which was prepared in-house by a powder metallurgy process. Pure titanium (Ti) was used as a cathode and source of Ti. Methane (CH4) and nitrogen (N2) gases were used as sources of C and N to form the Ti(C,N) coating applied in the CAPVD process. Tests showed that the composition and properties of Ti(C,N) were successfully varied by controlling the CH4-N2 ratio. The surface microhardness of coated carbide samples improved and the coefficient of friction declined as the carbon content incorporated within the Ti(C,N) coating increased.

AB - The properties of titanium carbonitride (TiCN) are a result of its composition, which can be adjusted by controlling the material's C-N ratio to a precise level. An experimental study was conducted to vary the composition and properties of TiCN. The substrate used for cathodic arc physical vapour deposition (CAPVD) was tungsten carbide (WC-6Co), which was prepared in-house by a powder metallurgy process. Pure titanium (Ti) was used as a cathode and source of Ti. Methane (CH4) and nitrogen (N2) gases were used as sources of C and N to form the Ti(C,N) coating applied in the CAPVD process. Tests showed that the composition and properties of Ti(C,N) were successfully varied by controlling the CH4-N2 ratio. The surface microhardness of coated carbide samples improved and the coefficient of friction declined as the carbon content incorporated within the Ti(C,N) coating increased.

KW - Cathodic arc physical vapour deposition (CAPVD)

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KW - TiCN coating

KW - XPS

KW - XRD

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