Characterization of a-Si: H/SiN multilayer waveguide polarization using an optical pumping application-LED

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Abstract

This paper describes the fabrication of a waveguide and the analysis of its polarization characteristics by applying light-emitting diode (LED) pumping lights to its surface. By using double tubed coaxial line (DTCL) microwave plasma chemical vapor deposition (MPCVD) equipment, an a-Si:H/SiN multilayer waveguide was fabricated whose thickness could be controlled at nanometer order. The main structural material of the waveguide sample consisted of a combination of layers of amorphous silicon hydrogen and silicon nitrate. Once the sample was ready, another major objective of the experiment was to analyze the polarization characteristics of the fabricated waveguide. The idea of the experiment was to analyze how the waveguide reacts when three types of LED (blue, yellow, and red) are radiated onto its surface. The results showed that the fabrication of the a-Si:H/SiN sample is successful. Most effective transmission results, which accord with the polarization characteristics analysis, were obtained.

Original languageEnglish
Pages (from-to)1421-1427
Number of pages7
JournalJournal of Zhejiang University: Science A
Volume10
Issue number10
DOIs
Publication statusPublished - Oct 2009

Fingerprint

Optical pumping
Light emitting diodes
Multilayers
Waveguides
Polarization
Fabrication
Amorphous silicon
Chemical vapor deposition
Nitrates
Experiments
Microwaves
Plasmas
Silicon
Hydrogen

Keywords

  • Double tubed coaxial line microwave plasma chemical vapor deposition (DTCL-MPCVD)
  • Light-emitting diode (LED)
  • Multilayer
  • Optical pumping
  • Waveguide

ASJC Scopus subject areas

  • Engineering(all)

Cite this

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title = "Characterization of a-Si: H/SiN multilayer waveguide polarization using an optical pumping application-LED",
abstract = "This paper describes the fabrication of a waveguide and the analysis of its polarization characteristics by applying light-emitting diode (LED) pumping lights to its surface. By using double tubed coaxial line (DTCL) microwave plasma chemical vapor deposition (MPCVD) equipment, an a-Si:H/SiN multilayer waveguide was fabricated whose thickness could be controlled at nanometer order. The main structural material of the waveguide sample consisted of a combination of layers of amorphous silicon hydrogen and silicon nitrate. Once the sample was ready, another major objective of the experiment was to analyze the polarization characteristics of the fabricated waveguide. The idea of the experiment was to analyze how the waveguide reacts when three types of LED (blue, yellow, and red) are radiated onto its surface. The results showed that the fabrication of the a-Si:H/SiN sample is successful. Most effective transmission results, which accord with the polarization characteristics analysis, were obtained.",
keywords = "Double tubed coaxial line microwave plasma chemical vapor deposition (DTCL-MPCVD), Light-emitting diode (LED), Multilayer, Optical pumping, Waveguide",
author = "Zan, {Mohd Saiful Dzulkefly} and Isamu Kato and {Ab Rahman}, {Mohd Syuhaimi} and Mustaza, {Seri Mastura}",
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T2 - H/SiN multilayer waveguide polarization using an optical pumping application-LED

AU - Zan, Mohd Saiful Dzulkefly

AU - Kato, Isamu

AU - Ab Rahman, Mohd Syuhaimi

AU - Mustaza, Seri Mastura

PY - 2009/10

Y1 - 2009/10

N2 - This paper describes the fabrication of a waveguide and the analysis of its polarization characteristics by applying light-emitting diode (LED) pumping lights to its surface. By using double tubed coaxial line (DTCL) microwave plasma chemical vapor deposition (MPCVD) equipment, an a-Si:H/SiN multilayer waveguide was fabricated whose thickness could be controlled at nanometer order. The main structural material of the waveguide sample consisted of a combination of layers of amorphous silicon hydrogen and silicon nitrate. Once the sample was ready, another major objective of the experiment was to analyze the polarization characteristics of the fabricated waveguide. The idea of the experiment was to analyze how the waveguide reacts when three types of LED (blue, yellow, and red) are radiated onto its surface. The results showed that the fabrication of the a-Si:H/SiN sample is successful. Most effective transmission results, which accord with the polarization characteristics analysis, were obtained.

AB - This paper describes the fabrication of a waveguide and the analysis of its polarization characteristics by applying light-emitting diode (LED) pumping lights to its surface. By using double tubed coaxial line (DTCL) microwave plasma chemical vapor deposition (MPCVD) equipment, an a-Si:H/SiN multilayer waveguide was fabricated whose thickness could be controlled at nanometer order. The main structural material of the waveguide sample consisted of a combination of layers of amorphous silicon hydrogen and silicon nitrate. Once the sample was ready, another major objective of the experiment was to analyze the polarization characteristics of the fabricated waveguide. The idea of the experiment was to analyze how the waveguide reacts when three types of LED (blue, yellow, and red) are radiated onto its surface. The results showed that the fabrication of the a-Si:H/SiN sample is successful. Most effective transmission results, which accord with the polarization characteristics analysis, were obtained.

KW - Double tubed coaxial line microwave plasma chemical vapor deposition (DTCL-MPCVD)

KW - Light-emitting diode (LED)

KW - Multilayer

KW - Optical pumping

KW - Waveguide

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