Atomic force microscope base nanolithography for reproducible micro and nanofabrication

Arash Dehzangi, Farhad Larki, Burhanuddin Yeop Majlis, Zainab Kazemi, Mohammad Mahdi Ariannejad, A. Makarimi Abdullah, Mahmood Goodarz Nasery, Manizheh Navasery, Sabar D. Hutagalung

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication.

Original languageEnglish
Title of host publicationIEEE International Conference on Semiconductor Electronics, Proceedings, ICSE
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages408-411
Number of pages4
ISBN (Print)9781479957606
DOIs
Publication statusPublished - 10 Oct 2014
Event11th IEEE International Conference on Semiconductor Electronics, ICSE 2014 - Kuala Lumpur
Duration: 27 Aug 201429 Aug 2014

Other

Other11th IEEE International Conference on Semiconductor Electronics, ICSE 2014
CityKuala Lumpur
Period27/8/1429/8/14

Fingerprint

Nanolithography
Nanotechnology
Microscopes
Atomic force microscopy
Fabrication
Silicon
Etching
Nanostructures
Silicon on insulator technology
Potassium hydroxide
2-Propanol
Anodic oxidation
Oxides
Alcohols

Keywords

  • Atomic force microscope
  • Local anodic oxidation
  • Nanolithography
  • Silicon-on-insulator

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

Cite this

Dehzangi, A., Larki, F., Yeop Majlis, B., Kazemi, Z., Ariannejad, M. M., Abdullah, A. M., ... Hutagalung, S. D. (2014). Atomic force microscope base nanolithography for reproducible micro and nanofabrication. In IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE (pp. 408-411). [6920884] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/SMELEC.2014.6920884

Atomic force microscope base nanolithography for reproducible micro and nanofabrication. / Dehzangi, Arash; Larki, Farhad; Yeop Majlis, Burhanuddin; Kazemi, Zainab; Ariannejad, Mohammad Mahdi; Abdullah, A. Makarimi; Nasery, Mahmood Goodarz; Navasery, Manizheh; Hutagalung, Sabar D.

IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. Institute of Electrical and Electronics Engineers Inc., 2014. p. 408-411 6920884.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Dehzangi, A, Larki, F, Yeop Majlis, B, Kazemi, Z, Ariannejad, MM, Abdullah, AM, Nasery, MG, Navasery, M & Hutagalung, SD 2014, Atomic force microscope base nanolithography for reproducible micro and nanofabrication. in IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE., 6920884, Institute of Electrical and Electronics Engineers Inc., pp. 408-411, 11th IEEE International Conference on Semiconductor Electronics, ICSE 2014, Kuala Lumpur, 27/8/14. https://doi.org/10.1109/SMELEC.2014.6920884
Dehzangi A, Larki F, Yeop Majlis B, Kazemi Z, Ariannejad MM, Abdullah AM et al. Atomic force microscope base nanolithography for reproducible micro and nanofabrication. In IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. Institute of Electrical and Electronics Engineers Inc. 2014. p. 408-411. 6920884 https://doi.org/10.1109/SMELEC.2014.6920884
Dehzangi, Arash ; Larki, Farhad ; Yeop Majlis, Burhanuddin ; Kazemi, Zainab ; Ariannejad, Mohammad Mahdi ; Abdullah, A. Makarimi ; Nasery, Mahmood Goodarz ; Navasery, Manizheh ; Hutagalung, Sabar D. / Atomic force microscope base nanolithography for reproducible micro and nanofabrication. IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE. Institute of Electrical and Electronics Engineers Inc., 2014. pp. 408-411
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