Application of taguchi's design of experiments in optimization of metal assisted chemical etching process

N. M. Nordin, A. W. Azhari, D. S.C. Halin, U. Hashim, Saleem H. Zaidi

Research output: Contribution to journalConference article

Abstract

In this study, statistical analysis using Taguchi's method was used to investigate the effects of various process parameters involved in metal assisted chemical etching (MACE) of silicon. The process parameters that include etching time and various etchant concentration were selected and visualized in Taguchi modelling. Each sample was then characterized using the field emission scanning electron microscopy (FESEM). All data was then analysed and evaluated using ANOVA and graph modelling in order to visualize the interaction of each model. Results showed that for etching rate, separation and size of Si nanowires, the predicted model is in agreement with the experimental data with R2 of 0.94, 0.99 and 0.98 respectively.

Original languageEnglish
Article number012059
JournalIOP Conference Series: Materials Science and Engineering
Volume572
Issue number1
DOIs
Publication statusPublished - 2 Aug 2019
Event2019 International Conference on Innovative Research, ICIR EUROINVENT 2019 - Iasi, Romania
Duration: 16 May 201917 May 2019

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Design of experiments
Etching
Metals
Taguchi methods
Silicon
Analysis of variance (ANOVA)
Field emission
Nanowires
Statistical methods
Scanning electron microscopy

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

Cite this

Application of taguchi's design of experiments in optimization of metal assisted chemical etching process. / Nordin, N. M.; Azhari, A. W.; Halin, D. S.C.; Hashim, U.; Zaidi, Saleem H.

In: IOP Conference Series: Materials Science and Engineering, Vol. 572, No. 1, 012059, 02.08.2019.

Research output: Contribution to journalConference article

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