Application of BOE and KOH+IPA for fabrication of smooth nanopore membrane surface for artificial kidney

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

This paper reports square silicon nanopore filtration membrane fabrication on <100>-oriented silicon substrate by employing potassium hydroxide (KOH) + isopropyl alcohol (IPA) wet etching. The aim of the study is to get a smooth membrane surface as the nanopore patterning base. A constant heated temperature of 80 °C employing double boil technique is used in both buffer oxide etching (BOE) and KOH etching steps to shorten time taken and get a better surface roughness. 10 minutes quick exposed nitride layer removal is achieved using the constant high temperature setting, while an add-on of 10 % IPA in KOH etchant AIDS in producing a uniform and smooth etched surface. A smooth surface roughness is required in patterning uniform filtration nanopores later on, and applied as a filtration membrane in artificial kidney.

Original languageEnglish
Title of host publicationProceedings of the 2017 IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages18-21
Number of pages4
ISBN (Electronic)9781509040285
DOIs
Publication statusPublished - 16 Oct 2017
Event11th IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017 - Batu Ferringhi, Penang, Malaysia
Duration: 23 Aug 201725 Aug 2017

Other

Other11th IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017
CountryMalaysia
CityBatu Ferringhi, Penang
Period23/8/1725/8/17

Fingerprint

isopropyl alcohol
Nanopores
kidneys
Etching
Alcohols
buffers
etching
membranes
Membranes
Fabrication
fabrication
Oxides
oxides
surface roughness
Surface roughness
acquired immunodeficiency syndrome
potassium hydroxides
Potassium hydroxide
Silicon
etchants

Keywords

  • artificial kidney
  • filtration membrane
  • surface roughness
  • uniform nanopore

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Instrumentation
  • Biomedical Engineering

Cite this

Mustafa, K. A., Yunas, J., Hamzah, A. A., & Yeop Majlis, B. (2017). Application of BOE and KOH+IPA for fabrication of smooth nanopore membrane surface for artificial kidney. In Proceedings of the 2017 IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017 (pp. 18-21). [8069130] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/RSM.2017.8069130

Application of BOE and KOH+IPA for fabrication of smooth nanopore membrane surface for artificial kidney. / Mustafa, Kamarul Asyikin; Yunas, Jumril; Hamzah, Azrul Azlan; Yeop Majlis, Burhanuddin.

Proceedings of the 2017 IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017. Institute of Electrical and Electronics Engineers Inc., 2017. p. 18-21 8069130.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Mustafa, KA, Yunas, J, Hamzah, AA & Yeop Majlis, B 2017, Application of BOE and KOH+IPA for fabrication of smooth nanopore membrane surface for artificial kidney. in Proceedings of the 2017 IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017., 8069130, Institute of Electrical and Electronics Engineers Inc., pp. 18-21, 11th IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017, Batu Ferringhi, Penang, Malaysia, 23/8/17. https://doi.org/10.1109/RSM.2017.8069130
Mustafa KA, Yunas J, Hamzah AA, Yeop Majlis B. Application of BOE and KOH+IPA for fabrication of smooth nanopore membrane surface for artificial kidney. In Proceedings of the 2017 IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017. Institute of Electrical and Electronics Engineers Inc. 2017. p. 18-21. 8069130 https://doi.org/10.1109/RSM.2017.8069130
Mustafa, Kamarul Asyikin ; Yunas, Jumril ; Hamzah, Azrul Azlan ; Yeop Majlis, Burhanuddin. / Application of BOE and KOH+IPA for fabrication of smooth nanopore membrane surface for artificial kidney. Proceedings of the 2017 IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017. Institute of Electrical and Electronics Engineers Inc., 2017. pp. 18-21
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abstract = "This paper reports square silicon nanopore filtration membrane fabrication on <100>-oriented silicon substrate by employing potassium hydroxide (KOH) + isopropyl alcohol (IPA) wet etching. The aim of the study is to get a smooth membrane surface as the nanopore patterning base. A constant heated temperature of 80 °C employing double boil technique is used in both buffer oxide etching (BOE) and KOH etching steps to shorten time taken and get a better surface roughness. 10 minutes quick exposed nitride layer removal is achieved using the constant high temperature setting, while an add-on of 10 {\%} IPA in KOH etchant AIDS in producing a uniform and smooth etched surface. A smooth surface roughness is required in patterning uniform filtration nanopores later on, and applied as a filtration membrane in artificial kidney.",
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