An investigation on structural and electrical properties of RF-sputtered molybdenum thin film deposited on different substrates

N. Dhar, P. Chelvanathan, M. Zaman, Kamaruzzaman Sopian, Nowshad Amin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Citations (Scopus)

Abstract

Molybdenum (Mo) is the prominent choice as the back contact for various thin film solar cells such as CIGS, CZTS and CdTe. Physical vapour deposition (PVD) technique especially sputtering process has been chosen as the foremost method to deposit Mo thin film on top of desired substrate due to ease of parametric control of growth conditions. In this paper, we reported the effect of various RF power, operating pressure as well as temperature on Mo films on top of Mo sheet and soda lime glass (SLG) deposited using RF magnetron sputtering. Uniform surface morphology was obtained as RF power, operating pressure and deposition temperature were optimised. However, at higher deposition temperature less uniform surface was observed. XRD pattern of Mo films showed two different peak of 〈200〉 and 〈211〉 in case of Mo sheet and single peak 〈110〉 in case of SLG. While peak intensity varies as deposition condition varies in case of Mo films deposited on Mo sheet. Electrical properties of Mo films on both Mo sheet and SLG were improved as RF power and deposition temperature are optimised. On the other hand, electrical properties are affected as operating pressure increased. Lower resistivity of 1.2×10 -9 .m and 6.65×10 -6 .Ω were found in case of Mo films deposited on Mo sheet and SLG. Surface roughness of 0.017 nm-19.32 nm were found in case of Mo films deposited on Mo sheet and 0.002 nm-5.04 nm were found in case of SLG. Roughness increased as RF power and deposition temperature increased. However, roughness decreased as operating pressure increased.

Original languageEnglish
Title of host publicationEnergy Procedia
PublisherElsevier BV
Pages186-197
Number of pages12
Volume33
DOIs
Publication statusPublished - 2013
Event2012 PV Asia Pacific Conference, PVAP 2012 - Singapore, Singapore
Duration: 23 Oct 201225 Oct 2012

Other

Other2012 PV Asia Pacific Conference, PVAP 2012
CountrySingapore
CitySingapore
Period23/10/1225/10/12

Fingerprint

Molybdenum
Structural properties
Electric properties
Thin films
Substrates
Lime
Glass
Surface roughness
Molybdenum deposits
Temperature
Physical vapor deposition
Magnetron sputtering
Surface morphology
Sputtering

Keywords

  • CIGS
  • CZTS
  • Mo back contact
  • Resistivity
  • RF magnetron sputtering
  • RF power

ASJC Scopus subject areas

  • Energy(all)

Cite this

An investigation on structural and electrical properties of RF-sputtered molybdenum thin film deposited on different substrates. / Dhar, N.; Chelvanathan, P.; Zaman, M.; Sopian, Kamaruzzaman; Amin, Nowshad.

Energy Procedia. Vol. 33 Elsevier BV, 2013. p. 186-197.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Dhar, N, Chelvanathan, P, Zaman, M, Sopian, K & Amin, N 2013, An investigation on structural and electrical properties of RF-sputtered molybdenum thin film deposited on different substrates. in Energy Procedia. vol. 33, Elsevier BV, pp. 186-197, 2012 PV Asia Pacific Conference, PVAP 2012, Singapore, Singapore, 23/10/12. https://doi.org/10.1016/j.egypro.2013.05.057
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