An alternative polymeric protection mask for bulk KOH etching of silicon

Rosminazuin Ab Rahim, Badariah Bais, Burhanuddin Yeop Majlis, Gandi Sugandi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

The utilization of a newly developed photosensitive polymeric coating, ProTEK PSB plays a significant role in realizing simple process steps in the fabrication of MEMS devices using bulk micromachining technology. The photosensitive coating serves as an alternative to the conventional silicon nitride mask of bulk KOH etching in devising MEMS devices, particularly suspended microcantilever structure. Although the coating is an excellent outer protective layer from any pinhole issues, the lateral etching in KOH solution is prominent, which results in an undercut issue. Therefore, the combination of ProTEK PSB and thermal oxide layer was studied for its possibility in obtaining minimum undercut-etch depth ratio of the polymeric coating in KOH (45%wt, 80°C). The combination of ProTEK PSB patterned on thermal oxide results in an effective etching condition attributed by minimum undercut ratio with respect to the etch depth.

Original languageEnglish
Title of host publicationDTIP 2012 - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS
Pages204-207
Number of pages4
Publication statusPublished - 2012
Event2012 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2012 - Cannes Cote d'Azur
Duration: 25 Apr 201227 Apr 2012

Other

Other2012 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2012
CityCannes Cote d'Azur
Period25/4/1227/4/12

Fingerprint

Masks
Etching
Silicon
Coatings
MEMS
Oxides
Micromachining
Silicon nitride
Fabrication
Hot Temperature

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Rahim, R. A., Bais, B., Yeop Majlis, B., & Sugandi, G. (2012). An alternative polymeric protection mask for bulk KOH etching of silicon. In DTIP 2012 - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (pp. 204-207). [6235295]

An alternative polymeric protection mask for bulk KOH etching of silicon. / Rahim, Rosminazuin Ab; Bais, Badariah; Yeop Majlis, Burhanuddin; Sugandi, Gandi.

DTIP 2012 - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS. 2012. p. 204-207 6235295.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Rahim, RA, Bais, B, Yeop Majlis, B & Sugandi, G 2012, An alternative polymeric protection mask for bulk KOH etching of silicon. in DTIP 2012 - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS., 6235295, pp. 204-207, 2012 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, DTIP 2012, Cannes Cote d'Azur, 25/4/12.
Rahim RA, Bais B, Yeop Majlis B, Sugandi G. An alternative polymeric protection mask for bulk KOH etching of silicon. In DTIP 2012 - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS. 2012. p. 204-207. 6235295
Rahim, Rosminazuin Ab ; Bais, Badariah ; Yeop Majlis, Burhanuddin ; Sugandi, Gandi. / An alternative polymeric protection mask for bulk KOH etching of silicon. DTIP 2012 - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS. 2012. pp. 204-207
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