Adsorption of molecular and atomic hydrogen on vacuum-cleaved V2O5(0 0 1)

B. Tepper, B. Richter, A. C. Dupuis, H. Kuhlenbeck, C. Hucho, P. Schilbe, Mohd. Ambar Yarmo, H. J. Freund

Research output: Contribution to journalArticle

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Abstract

The (0 0 1) surface of a vacuum-cleaved V2O5single crystal has been studied using high-resolution electron energy loss spectroscopy (HREELS), UV-photoelectron spectroscopy angular resolved photoemission spectra (ARUPS) and X-ray photoelectron spectroscopy (XPS). Special emphasis was put onto the interaction with molecular and atomic hydrogen and the existence of hydroxyl groups on the surface. Dosage of atomic hydrogen induces reduction of the V2O5(0 0 1) surface as is obvious from the evolution of intensity near to the Fermi edge in the photoelectron spectra. Even after strong reduction no indications of OH groups could be observed in the spectra. Detailed inspection of the ARUPS and HREELS data and comparison with theory leads to the conclusion that the hydrogen induced defects on the surface are most likely missing bridging oxygen atoms whereas the terminal oxygen atoms of the vanadyl groups appear to be stable with respect to removal by atomic hydrogen.

Original languageEnglish
Pages (from-to)64-72
Number of pages9
JournalSurface Science
Volume496
Issue number1-2
DOIs
Publication statusPublished - 1 Jan 2002

Fingerprint

Hydrogen
Vacuum
Adsorption
vacuum
adsorption
Electron energy loss spectroscopy
hydrogen
oxygen atoms
energy dissipation
photoelectron spectroscopy
electron energy
Oxygen
Atoms
Vanadates
high resolution
Photoemission
Photoelectron spectroscopy
Photoelectrons
Ultraviolet spectroscopy
Hydroxyl Radical

Keywords

  • Angle resolved photoemission
  • Chemisorption
  • Electron energy loss spectroscopy (EELS)
  • Hydrogen atom
  • Hydrogen molecule
  • Phonons
  • Vanadium oxide
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Tepper, B., Richter, B., Dupuis, A. C., Kuhlenbeck, H., Hucho, C., Schilbe, P., ... Freund, H. J. (2002). Adsorption of molecular and atomic hydrogen on vacuum-cleaved V2O5(0 0 1). Surface Science, 496(1-2), 64-72. https://doi.org/10.1016/S0039-6028(01)01607-7

Adsorption of molecular and atomic hydrogen on vacuum-cleaved V2O5(0 0 1). / Tepper, B.; Richter, B.; Dupuis, A. C.; Kuhlenbeck, H.; Hucho, C.; Schilbe, P.; Yarmo, Mohd. Ambar; Freund, H. J.

In: Surface Science, Vol. 496, No. 1-2, 01.01.2002, p. 64-72.

Research output: Contribution to journalArticle

Tepper, B, Richter, B, Dupuis, AC, Kuhlenbeck, H, Hucho, C, Schilbe, P, Yarmo, MA & Freund, HJ 2002, 'Adsorption of molecular and atomic hydrogen on vacuum-cleaved V2O5(0 0 1)', Surface Science, vol. 496, no. 1-2, pp. 64-72. https://doi.org/10.1016/S0039-6028(01)01607-7
Tepper B, Richter B, Dupuis AC, Kuhlenbeck H, Hucho C, Schilbe P et al. Adsorption of molecular and atomic hydrogen on vacuum-cleaved V2O5(0 0 1). Surface Science. 2002 Jan 1;496(1-2):64-72. https://doi.org/10.1016/S0039-6028(01)01607-7
Tepper, B. ; Richter, B. ; Dupuis, A. C. ; Kuhlenbeck, H. ; Hucho, C. ; Schilbe, P. ; Yarmo, Mohd. Ambar ; Freund, H. J. / Adsorption of molecular and atomic hydrogen on vacuum-cleaved V2O5(0 0 1). In: Surface Science. 2002 ; Vol. 496, No. 1-2. pp. 64-72.
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