100 nm period grating by high-index phase-mask immersion lithography

Yannick Bourgin, Yves Jourlin, Olivier Parriaux, Anne Talneau, Svetlen Tonchev, Colette Veillas, Petri Karvinen, Nicolas Passilly, Md Zain Ahmad Rifqi, Richard M. De La Rue, Jürgen Van Erps, David Troadec

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film under immersion. The paper describes the phase mask design, its fabrication, the effect of electron-beam lithographic stitching errors and optical assessment of the fabricated sub-cutoff grating.

Original languageEnglish
Pages (from-to)10557-10565
Number of pages9
JournalOptics Express
Volume18
Issue number10
DOIs
Publication statusPublished - 10 May 2010
Externally publishedYes

Fingerprint

submerging
masks
lithography
gratings
interferometry
cut-off
incidence
electron beams
fabrication
wavelengths

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Bourgin, Y., Jourlin, Y., Parriaux, O., Talneau, A., Tonchev, S., Veillas, C., ... Troadec, D. (2010). 100 nm period grating by high-index phase-mask immersion lithography. Optics Express, 18(10), 10557-10565. https://doi.org/10.1364/OE.18.010557

100 nm period grating by high-index phase-mask immersion lithography. / Bourgin, Yannick; Jourlin, Yves; Parriaux, Olivier; Talneau, Anne; Tonchev, Svetlen; Veillas, Colette; Karvinen, Petri; Passilly, Nicolas; Ahmad Rifqi, Md Zain; De La Rue, Richard M.; Van Erps, Jürgen; Troadec, David.

In: Optics Express, Vol. 18, No. 10, 10.05.2010, p. 10557-10565.

Research output: Contribution to journalArticle

Bourgin, Y, Jourlin, Y, Parriaux, O, Talneau, A, Tonchev, S, Veillas, C, Karvinen, P, Passilly, N, Ahmad Rifqi, MZ, De La Rue, RM, Van Erps, J & Troadec, D 2010, '100 nm period grating by high-index phase-mask immersion lithography', Optics Express, vol. 18, no. 10, pp. 10557-10565. https://doi.org/10.1364/OE.18.010557
Bourgin Y, Jourlin Y, Parriaux O, Talneau A, Tonchev S, Veillas C et al. 100 nm period grating by high-index phase-mask immersion lithography. Optics Express. 2010 May 10;18(10):10557-10565. https://doi.org/10.1364/OE.18.010557
Bourgin, Yannick ; Jourlin, Yves ; Parriaux, Olivier ; Talneau, Anne ; Tonchev, Svetlen ; Veillas, Colette ; Karvinen, Petri ; Passilly, Nicolas ; Ahmad Rifqi, Md Zain ; De La Rue, Richard M. ; Van Erps, Jürgen ; Troadec, David. / 100 nm period grating by high-index phase-mask immersion lithography. In: Optics Express. 2010 ; Vol. 18, No. 10. pp. 10557-10565.
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